Used SEMITOOL WST 172 #142238 for sale

SEMITOOL WST 172 photoresist equipment is an automated spray coating system best suited for semiconductor/MEMS wafer processing. It is highly configurable and supports a wide range of chemistries, having the capability to develop coatings with a thickness range of 0.1-4 μm with a uniformity of 3-4%. The unit can handle up to eight wafers at a time and is designed with a platform that can be used with a variety of process modules, including pre-clean, spray coating, developer, and scrubber. The machine uses an integrated direct-yielding nozzle-dispensing manifold tool to generate uniform coating thickness with a high resolution. The main unit is equipped with a Robot End Effector (REE), a spray nozzle, actuators and sensor. The nozzle is adjustable, to facilitate control of the droplet size, spray angle and spray pressure, as well as the positioning of the spray pattern. The REE is mechanically driven and provides an adjustable broadcast configuration to achieve optimal spray uniformity. The aerosol is evenly distributed in a controlled manner to ensure accurate, consistent and repeatable coating results. WST 172 features an integrated dual-platen rotation for aligning two or more wafers for coating, with a process time of approximately 15 minutes per wafer. Other features include an advanced pattern control for producing accurate patterns, a multi-step adjustment for programmable spray rates, a particle monitoring asset for validating coatings, and a nitrogen module for inert and controlled ambient shadowing during the process. The model has a dedicated user interface and alerts of any problems during the process. The equipment operates with a low-temperature spray process, which makes it suitable for use with various substrates, including plastics, glass and GaAs. The spray process helps to reduce hazardous organic solvents, therefore reducing the risk of disasters and preventing unnecessary damage. SEMITOOL WST 172 is also capable of coordinating with other SEMITOOL machines, allowing for even faster, more efficient processes. Overall, WST 172 photoresist system offers high levels of accuracy and repeatability and is suitable for applications from single wafer to large scale processing. The unit ensures a high degree of uniformity, improved process control and reduced waste, making it an ideal choice for semiconductor and microfabrication applications.