Used SEMITOOL WST-306MG #9014933 for sale
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ID: 9014933
Wafer Size: 8"
Vintage: 1999
Spray solvent tool, 8"
Front loading with on-axis spin
Self-contained fluid dispensing and recirculation
System surfaces that come in contact with solvent solutions are stainless steel or Teflon coating
System spray and atomizing manifolds provide flexible patterns for fluid delivery
Microprocessor controlled process recipes perform system functions
Rotor Installed for 8", p/n A192-81M-0215
Power requirements: 208 V, 40 A, 50/60 Hz, 3 Phase
1999 vintage.
SEMITOOL WST-306MG is a photoresist equipment designed for high-performance wafer processing. This system is ideal for creating nanoscale structures for advanced device applications. It features an automated loading unit for up to 6" wafers as well as a programmable heater/ coolant machine for precise temperature control. The photoresist tool also includes a controlled atmosphere to prevent oxidation during processing. WST-306MG includes several advanced features for accurate processing of photoresist-coated wafers. It has three levels of automated optics to determine the exact focus of each pattern on the wafer. A precision substrate table permits alignment of the photoresist-coated wafer prior to processing. This alignment is important for large area films to prevent distortion of the pattern upon exposure. Furthermore, automated adjustments of focus and stage position can be made during processing. SEMITOOL WST-306MG utilizes a precision stepper motor to move the wafer at predetermined steps across the area to be exposed. In addition, it boasts a high aspect ratio illumination asset to allow for 3-D structuring of the material. The model is designed to integrate with standard CAD systems to allow for simple pattern transfer. The photoresist equipment has been designed for reliability and consistent performance. It features a robust vibration-free rigidity to ensure optimal alignment throughout the entire process. Its sub-ambient dry processing capabilities ensure a high-quality application of photoresist films. Moreover, its user-friendly interface makes operation simple and efficient. WST-306MG is ultimately ideal for nanoscale research applications, such as photomask fabrication, semiconductor device fabrication, lithography mask fabrication, thin film deposition, and optical element production, among other applications. Its advanced optics and controlled environment permit precise and accurate processing to create nanoscale structures. These nanostructures can then be used in the development of advanced devices and products.
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