Used SEMITOOL WST-306MI #142239 for sale

SEMITOOL WST-306MI Photoresist Equipment is an advanced photolithography system designed to offer precision processing solutions. It uses ultraviolet (UV) light and a photo reactive material to create structures on semiconductor substrates and other materials. The unit is a two arm machine with two separate tanks, one for processing and one for rinse, and has the capability to measure and control both UV dose and focus levels during exposure. WST-306MI photoresist machine features a high-resolution stepper alignment stage with both coarse and fine control. The stepper has a highly stable alignment repeatability of ±1.5 μm and a step size of 0.1 μm. It has a range of exposure settings from full field to ultra hard-edge exposure using 1, 2, and 4 exposure spots and a resolution of up to 0.5 μm. The UV irradiated exposure time can range from 10 seconds to 10 minutes. SEMITOOL WST-306MI tool offers advanced process control, automation, and safety such as anti-burning, anti-slosh, dose monitor, and real-time exposure control. The asset also has an integrated wafer handling model with in-tank, cassette-to-cassette, and in-situ load, unload, and mapping processing modes. The equipment's advanced contamination control system can perform repeatable clean and deionised rinses with a light harm to the substrate while maintaining low total nucleation count. The material handling unit, along with anti-drainage, anti-climbing, and intelligent cleaning algorithms, ensures particle levels remain well within industry standards for particle levels and cleanliness. WST-306MI Photoresist Machine has been designed for precision, repeatability, and process control, making it an ideal choice for a wide variety of lithography applications. It offers an efficient, safe, and cost-effective solution for all projects needing micron-level detail and high accuracy. With its unique features, SEMITOOL WST-306MI makes it the perfect choice for precision lithography tool for advanced semiconductor fabrication and other nanotechnology applications.