Used SEMITOOL WST-308 #9155218 for sale

Manufacturer
SEMITOOL
Model
WST-308
ID: 9155218
Solvent spray system 3 Phase Current: 40 A Frequency: 50 / 60 Hz Voltage: 208 V 2010 vintage.
SEMITOOL WST-308 is a full featured photoresist processing equipment capable of delivering extremely tight process control, precise repeatability and tolerances for production applications. It provides a variety of wet and dry processable photoresists that can be used in both optical and electron beam lithography. SEMITOOL WST 308 features a fully automated, single-wafer process system to enable precision photoresist coating, baking, and pre-edgebead-edge cleanup cleaning. Photoresist coating is controlled by a precise Rotary Jet Spray Coater™ and employs a proprietary rotary nozzle to atomize the photoresist while spraying onto the wafer. The unit features independent temperature and speed profile control for accurate coating thickness, repeatability and adhesion. The edges of the wafer are pre-edgebead clean and dry-edge rework with the integrated Edge-Bead Removal Machine (EBRS)™. WST-308 tool is equipped with an advanced vacuum sublimation bake asset that provides precise uniformity and fast turnaround times. It features dual stage heating to stabilize temperature and ease the point of evaporation lockout. The bake model includes a recovery feature to ensure that precise process parameters are maintained between successive loads. The equipment processes standard, resist-coated substrates from a range of suppliers. Photoresist profiles and recipes can be stored and recalled for repeated use. The system meets stringent process control parameters and provides excellent uniformity and repeatability. The unit is capable of replacing manual techniques for critical processes such as stripping and cleaning, which can lead to improved process performance and yield. The machine also features a variety of options and safety features including an atmospheric pressure monitor, an insulated oil bath, and an automated safety interlock. WST 308 is designed to meet the requirements of a wide range of photoresist applications, providing robust and accurate performance. This tool offers an outstanding combination of flexibility, performance, and reliability for medium- to high-volume production processes.
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