Used SEMITOOL WST-406MG #9265375 for sale

SEMITOOL WST-406MG Photoresist Equipment is a wet station that provides consistent, reliable, and accurate results in photoresist processes. It incorporates optimal recirculation techniques to maintain even temperature and solution concentration, which alleviates the need for frequent solution changes or draining. The system also consists of a durable 406MG tank and lid combination that features anti-tip technology for easy and safe handling of substrates during processing. Its intuitive touch panel interface with an easy-to-navigate menu provides reliable machine control and monitoring while offering precise process parameters for improved yield and repeatability. The unit offers a mix of wet bench capabilities that meets the needs of any fabrication activity. It features independent filtration to maintain solution purity, pH monitoring to ensure proper performance, and a toolkit for easy maintenance. The machine also has a stainless steel spray rinse station that helps reduce water usage and clean chemical deposits from tank walls and parts. This clean-in-place (CIP) capability helps prevent corrosion and improves overall tank life. The tool enables uniform wetted surface development (WSD) of photo resist, which improves part consistency and yields. Each of the five process chambers offer controlled agitation and filtration to obtain repeatable and consistent process parameters. Available features include temperature monitoring and control, spray washing profiles, and a variety of masking systems for small to large assemblies. The asset also has the capability to detect and manage large substrate or container weights to prevent tipping and overfilling. It operates in a clean, factory-sealed environment with automatic pressure compensation so the process always remains within desired parameters. This eliminates any potential contamination or exposure to open air while also reducing human interaction. SEMITOOL WCT-406MG is an ideal machine for medium-throughput, cost-effective photoresist operations. Its ability to perform continuously while safely handling substrates makes it a valuable asset to fabrication labs. The model can help reduce labor costs and provide consistent results that improve yield and product quality.