Used SEMITOOL WST406MG #9248864 for sale
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ID: 9248864
Wafer Size: 4"
Vintage: 2000
Spray solvent system, 4"
Chemical cabinet included
(2) Tanks:
Redian PRS1000
Fresh PRS1000
Graphic controller / Display screens
Front loading with on-axis spin
2000 vintage.
SEMITOOL WST406MG is a state-of-the-art photoresist equipment that is designed to meet the highest standards for use in microelectronic manufacturing applications. The system features a number of advanced components designed to provide superior results in the photoresist process. At the core of the unit is a powerful 8-lane handling machine capable of precision positioning of the photoresist. This tool is designed to optimize the photoresist flow for the highest levels of process throughput. Additionally, the unit features a number of advanced features designed to enhance the performance of the photoresist process, such as temperature control, air stabilization, and more. In addition to the handling asset, the model also features an advanced laser-based mask alignment equipment. This system provides precise alignment with the photoresist material, ensuring highly accurate results. Additionally, the unit uses precise wavelength control for exposure time optimization, resulting in greater product yields and higher throughput. WST406MG also features a highly advanced software suite. This software enables exceptional control over the photoresist process, allowing for fine-tuning of the parameters for superior results. Additionally, the software is highly intuitive, allowing users to quickly adjust and optimize settings. Finally, the machine is highly reliable and durable to ensure reliable performance over a long lifetime. Its modular design allows for easy tool maintenance and repair, and its components feature a number of protective features designed to extend the asset's lifetime. Overall, SEMITOOL WST406MG is a highly sophisticated photoresist model designed to provide superior performance over a long service life. Its advanced components and software enable highly optimized processing of the photoresist material, resulting in superior product yields and greater process throughput. As such, it is an ideal choice for microelectronic manufacturing applications.
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