Used SEMIX Opus 2/3 #293650490 for sale

SEMIX Opus 2/3
Manufacturer
SEMIX
Model
Opus 2/3
ID: 293650490
Wafer Size: 8"-12"
SOG Track, 8"-12" Temperature: 25°~130°C.
SEMIX Opus 2/3 is a photoresist equipment designed to produce slick, high resolution devices with minimal defects. It is manufactured by global company SEMIX, a leading provider of advanced photolithography technologies. The system offers high-end lithography performance and feature sizes of 20 nm and above. It consists of two main components: the Optic Pro tool and the Wafer Management Unit (WMS). The Optic Pro is the primary component of SEMIX Opus 2/3 machine, responsible for bringing high-resolution images to the wafer. It features a unique array of optical components that work together to create a high-contrast and then frame-shifted image of the desired pattern on the wafer. The WMS, on the other hand, is the balancing and controlling component of the tool. It provides a physical interface between the Optic Pro and the wafer, managing the flow of chemicals, mechanical motions, and other environmental conditions needed for the lithography process. It uses advanced control systems to monitor and adjust various parameters such as temperature, pressure, and light exposure to ensure accuracy and repeatability. SEMIX Opus 2/3 asset process starts with applying a light-sensitive photopolymer layer known as photoresist to a silicon wafer. Once this layer is applied, the Optic Pro tool will project a mask of the desired pattern onto the wafer via multi-level diffraction optics. As the light passes through this pattern, it will be blocked or transmitted depending on design requirements. Any areas where light is blocked will be protected from the developer solution and remain un-etched. The remainder of the wafer will be washed away, leaving behind only the desired pattern. The next step is the rinse-off process. Here, the undesired resist layer is rinsed away from the wafer, leaving behind a crisp, clean pattern. The resist is then stripped away from the photoresist with a specialized dry/wet strip tool. Finally, the prepared wafer is diced into the required device structures and inspected for any imperfections. SEMIX Opus 2/3 is an efficient and precise photoresist model that enables the production of high-quality microdevices with minimal defects. It is ideal for producing the finest designs with the most innovative materials on the market.
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