Used SEMIX / TAZMO SOG Track System #293616842 for sale

SEMIX / TAZMO SOG Track Equipment is an innovative photoresist system designed to provide semiconductor and other device manufacturers with a cost-effective solution for creating circuit structures. The unit can be used to form patterns of any shape or size, and provides precise control over the resultant structures due to its ability to rapidly produce photoresist layers of uniform thickness. The machine utilizes a spin-on glass (SOG) track to create the photoresist layer, which is then exposed through a photomask to create a desired pattern. The track is constructed from a rotatable substrate layer within a housing, which holds the substrate in place while it is being spun at high speeds. This ensures uniform glass deposition as the entire surface is exposed to the same amount of spin rate, which prevents distortion or contamination of the layer. The substrate layer can then be advanced or back tensioned in order to control the thickness of the SOG layer, and a heating element can also be used to vary the temperature for more precise control. The photomask used in SEMIX SOG Track Tool is made up of several layers. The upper layers are composed of fine metal patterns, while the lower layers are composed of wax polymers that have been designed to prevent any interference from exposure light. The exposure light is then passed through the mask onto the deposited photoresist layer, which will then perform the desired patterning operation. TAZMO SOG Track Asset is highly customizable and efficient, offering flexibility to the end user. By controlling the speed of rotation, the layer's thickness and the temperature of the heating element, the user can create a variety of intricate structures for different device applications. Additionally, the track is easy to clean and can be reused, making it cost-effective and efficient. Overall, SOG Track Model is an efficient solution for semiconductor and other device manufacturers, providing a reliable and cost-effective way to create intricate structures. It offers flexibility and control over the resultant photoresist layer, enabling the user to create any shape or size of pattern for any application.