Used SEMIX / TOK TR 6132UD #9085096 for sale

SEMIX / TOK TR 6132UD is a photo-resist equipment designed to deliver precise thin film patterning and coating on a variety of materials, including substrates for semiconductors or other microelectronic components. The system is suited for applications where fine line width resolution is needed, such as semiconductor device processing, MEMS fabrication, and EMI shielding. The unit utilizes an integrated machine of light source, optics, stage control, and photoresist processes. The LED light source, which provides a uniform illuminating diffuse light over the full wafer swath, is capable of producing both short and long wavelength components simultaneously, enabling exposure of a wide range of photoresists. The high numerical objectives, with associated +/- 5 micron resolution, provide very high resolution imaging of 10 microns or less. The stage control tool monitors the position and velocity of the wafer table, allowing for precise and repeatable positioning of wafers in each of the exposure steps of the process. The asset is also temperature-controlled to ensure accurate exposure levels of the photoresist, enabling accurate patterning and uniform film thickness across the entire wafer. The model employs a precision wafer spin process, with a speed range from 0-4000 RPM, allowing for uniform spreading of the photoresist across the entire wafer. The resulting thin film pattern quality is excellent, with superior process capability for recognizing small patterns. Finally, the equipment is equipped with sophisticated software that monitors and records the exposure parameters for each process step, enabling tracking of the process history. Overall, TOK TR 6132UD provides a highly reliable system with precise patterning capabilities, enabling the creation of consistent and accurate thin film coatings on a variety of materials. With integrated LED light source, high resolution optics, stage control, and wafer spin, the unit is equipped to provide the highest quality patterning and the best process control for demanding thin film microelectronics applications.