Used SEMIX / TOK TS7171D-H #9252318 for sale

SEMIX / TOK TS7171D-H Photoresist Equipment is an advanced photoresist system with a high throughput, superior standard of repeatable results and overall excellent performance. This unit is well suited for hardmask etching, wet and dry developing, and advanced processes such as thick film liftoff and advanced lithography applications. The machine boasts an impressive feature set designed to help optimize photoresist processes and maximize throughput. At the heart of the tool is its powerful scanner, which can easily process large wafers. The asset includes a thermally stabilizing oven, built-in fan, and an advanced air filtration model, which allows for an optimized air flow to all areas of the equipment. This helps to provide clean, particle-free results and ensure high yields. TOK TS7171D-H Photoresist System also features an intuitive, user-friendly touch interface control panel. Its features include control of overlay tolerance, exposure increments, scan speed, temperature tolerances, thermal uniformity and more. The unit also includes a patented cross-scan technology, which significantly increases scan speeds and eliminates misalignment. The touch control panel is very user-friendly and provides users with an easy way to monitor and adjust the current process. The machine also has a number of safety features including a centralized interlock tool, over-temperature alarm, fume hood status monitoring, video monitoring and emergency shut off systems. This ensures a safe working environment for operators as well as optimal performance of SEMIX TS7171D-H PhotoresistAsset. TS7171D-H Photoresist Model is ideal for applications that require high throughput, repeatable results, optimum process control and optimization, and superior safety standards. The equipment is also equipped with an advanced monitoring and diagnostic system which can help detect potential problems before they become critical, thus preventing costly downtime.