Used SEMIX TR 6133UD #9226635 for sale

SEMIX TR 6133UD is a photoresist equipment designed to provide direct lithographic imaging of tiny electronic, mechanical, and semiconductor device features and components with high accuracy and precision. The system is capable of high resolution imaging at both the sub-micron and nanometer levels. Its wafer plates are designed with features that maximize contact-level surface imaging, allowing for extremely accurate results. TR 6133UD unit utilizes a unique photoresist coating to enable high-accuracy direct lithography imaging. This coating is specifically designed to ensure minimal line width variation, accurate lines, and reliable, reproducible exposures. Additionally, the coating is resistant to water, chemicals, and other liquid contaminants that could impede process accuracy. Along with the photoresist coating, the machine utilizes a number of proprietary technologies to ensure maximum printing accuracy. These include a highly precise optical tool with specialized lens designs, advanced optics alignment techniques, and stringent automation for positioning the photoresist layer. SEMIX TR 6133UD asset supports a range of photoresist compositions, enabling users to customize their imaging process for specific device requirements. This includes various types of illumination sources, such as thermal, ultraviolet (UV), and deep ultraviolet (DUV) light. Additionally, the model includes a high-resolution, thermally isolated mini-stepper motor to ensure minimal thermal drift. Further, TR 6133UD equipment is designed with an integrated alignment mark recognition system. This unit utilizes a high-precision optical sub-machine to accurately measure and distinguish features such as alignment marks, enabling precise alignment of multiple exposures across the entire wafer plate. To ensure reliable operation, SEMIX TR 6133UD tool is supported by an extremely high-quality control asset. This model includes features such as adaptive time and temperature control, automated reticle positioning, and high-resolution imaging capability. TR 6133UD photoresist equipment offers exceptional precision and repeatability, enabling users to produce extremely accurate micro- and nanostructure imaging with excellent resolution and fidelity. Its optimized imaging performance and integrated control system ensure that users can reliably produce high-quality results for their most demanding imaging applications.