Used SEMIX TR 6133UD #9250101 for sale

SEMIX TR 6133UD
Manufacturer
SEMIX
Model
TR 6133UD
ID: 9250101
Wafer Size: 6"
SOG Coater, 6".
SEMIX TR 6133UD is a state-of-the-art photoresist equipment designed for the microelectronics industry. This system was developed to meet the growing demands for ultra-fine line-widths, with the capability to process feature lines down to 0.3 microns. The main processing modules are the sprayer unit, the PAD processor and the E-Beam (e-beam) module. The sprayer unit is designed to quickly and accurately apply photoresist to a substrate. This is done utilizing a parallel beam that is created by a 6-axis robotic arm. The rotational stage is used to precisely position a substrate on the sprayer while a heated nozzle applies a uniform, uniform layer of the photoresist to the substrate. This unit enables users to attain a high degree of resolution when processing a substrate. The PAD processor is responsible for controlling the process parameters. It enables users to set the photoresist composition and precise exposure parameters in order to accurately process the substrate. One of the advantages of the PAD processor is that it can be used with a wide range of photoresists. In addition, the PAD processor also allows users to quickly adjust the parameters for different substrates. The E-Beam module is designed to be used in conjunction with the PAD processor to accurately expose the photoresist. It uses a powerful electron beam to achieve uniform feature lines and provide a high degree of resolution when processing the substrate. The E-Beam module also has the ability to automatically zoom in on small features when patterning a substrate. Overall, TR 6133UD is a powerful photoresist unit for the microelectronics industry. It utilizes a combination of sprayer, PAD processor and E-Beam modules to effectively process substrates. The machine provides a high degree of resolution and accuracy and is designed to process feature lines down to 0.3 microns. It is an excellent choice for those looking for top-of-the-line photoresist capability.
There are no reviews yet