Used SEMIX TR 6133UD #9284320 for sale

SEMIX TR 6133UD is a high-performance photoresist equipment offering exceptional feature resolution, low distortion, high process stability and low chemical waste. It is a fully automated and programmable system designed to minimize time and labor costs when executing advanced photolithography processes. The photoresist unit utilizes an advanced vacuum exposure machine that utilizes light exposure modulation as the primary tool technology. The asset is capable of exposing advanced features with high precision, high repeatability and low thermal distortion. The enhanced resolution and high process stability makes TR 6133UD ideal for creating extremely small and precise feature sizes. The most notable feature of SEMIX TR 6133UD is its ability to deliver an advanced and precise feature size control, unlike traditional optical systems. The model utilizes specially designed optic masks with multi-layer dielectric deposition that enables the photoresist to be exposed to a higher frequency of exposure to achieve finer features down to nm sizes. TR 6133UD is also designed to minimize chemical waste during lithography processes. This is achieved by utilizing a combination of water and surfactant to reduce chemical waste. Additionally, the equipment utilizes a closed loop regeneration cycle which minimizes the risk of cross contamination during the regen process and improves process yields. The SIMIX SEMIX TR 6133UD is designed to facilitate the most advanced lithography processes, including DWELL (Direct Write Electronic Lithography) techniques. The system is compatible with multiple coating and spin-coating solutions, enabling the use of specialty thin-film coatings for both thin and thick substrates. The unit also has an advanced feature of both temperature and humidity monitoring built-in, enabling users to ensure their processes are executed in exact conditions every time. The powerful and automated programming machine allows the user to easily control parameters such as temperature, exposure time and humidity in order to achieve superior results. TR 6133UD photoresist tool is an advanced, highly precise, and programmable tool designed to meet the most demanding needs of advanced photolithography process. The asset offers increased process stability and chemical waste reduction, ensuring superior feature resolution and accuracy.