Used SEZ / LAM RESEARCH 4300 #293587004 for sale

SEZ / LAM RESEARCH 4300 Photoresist Equipment is a revolutionary tool designed for applications such as semiconductor wafer processing, microelectronic device fabrication, and other precision operations. This system is equipped with a production-level 200mm Class 1 lithography tool. It enables fast unit operation, accurate resists exposure and excellent resolution, as well as flexibility and scalability. SEZ/LAM4300 features a wafer-handling machine that consists of an ion implanter and an electron-beam evaporator. This allows for precision resist application and profile modifications, both of which can be performed successfully on substrates of varying sizes. The tool allows for multiple exposure settings which can be customized for a project's exact requirements. The MaximusTM software suite can also be used to monitor and control the asset, which ensures a consistent resist performance for repeatable processes. The model utilizes a powerful optics equipment consisting of FOUP (Front-Opening Unified Pod) technology and is built for high-throughput operation. The FOUP enables rapid transfer of wafers between its internal carriers and the DPS (Direct Plasma Sprayer). The DPS is a 300mm compliant lithography tool that focuses the ion beam to precisely etch the resist. The MaxEtch tool suite is integrated with the DPS, which allows for exposure parameters to be adjusted quickly and easily. LAM RESEARCH/LAM SEZ 4300 also features a set of advanced features such as an in-depth library of exposure recipes and pre-set resist profiles. It allows for complete customization of etch processes including patterend and uniform etchings. The system also features Endura Interface, which is designed to provide access to multicloud functionality and support mass production. Finally, SEZ / LAM RESEARCH/LAM LAM RESEARCH 4300 photoresist unit is coupled with global service and support and meets compliance standards such as SEMI S2, J-STD-001 and IEC60881.