Used SEZ / LAM RESEARCH 4300 #293652063 for sale

SEZ / LAM RESEARCH 4300 photoresist equipment is a specialized tool used for processing semiconductor manufacturing. The system utilizes photolithography, a process which involves transferring a desired pattern from a mask onto a semiconductor substrate. SEZ 4300 unit is designed to quickly and accurately produce photoresist coatings on substrates. LAM RESEARCH 4300 machine utilizes a high power light source and a shutter exposure stage. This exposure stage utilizes an array of LED diodes, blocking and unblocking the exposure to the substrate. This exposure stage is highly precise, with a resolution of 15 microns and a repeatability of +/- 3 microns. The exposure stage is also designed to be extremely fast, with a shutter speeds up to 50 microseconds. 4300 is enhanced by its minimal maintenance requirements. The tool has a built in cleaning asset and uses a vacuum chuck for wafer handling. This eliminates manual cleaning steps and reduces the likelihood of contamination. SEZ / LAM RESEARCH 4300 model also features front-mounted spin coating assemblies. The assemblies provide a consistent, uniform coat of photoresist onto the substrate. The spin coating assemblies minimize waste and prevents the formation of uneven coating thicknesses, keeping photoresist costs low. SEZ 4300 equipment includes a PC-based software package that can be configured to execute specific processes and recipes. This software, together with the sophisticated components of LAM RESEARCH 4300, increases the repeatability and speed of production, ensuring higher quality photoresist coats. Overall, 4300 photoresist system is an advanced and reliable unit designed to quickly and precisely create photoresist coatings on substrates. The machine's fast exposure speed and precise exposure control produces consistent and repeatable photoresist patterns with minimal maintenance requirements. This makes SEZ / LAM RESEARCH 4300 an invaluable tool for semiconductor production.