Used SEZ / LAM RESEARCH 4300 #293662192 for sale

SEZ / LAM RESEARCH 4300 Photoresist Equipment is a state-of-the-art photolithography system designed for the development of high-end semiconductor devices. The unit features a large, high-resolution digital mask aligner with a numerical aperture of 0.5 and a 12.7 micron field size, making it ideal for device fabrication. The machine also includes a high-precision, self-cleaning dispense unit for the deposition of photoresist material and a user-friendly software suite to control the entire process. The tool employs a multi-step process to deposit and pattern the photoresist material. First, a layer of photoresist is dispensed over the substrate, and a computer-guided laser is then used to expose the photoresist material to the desired pattern. Next, the substrate is exposed to an intense ultraviolet light in order to harden the exposed photoresist material. Finally, the substrate is subjected to a series of chemical processes in order to enhance the resolution of the final pattern. SEZ 4300 is designed to provide superior resolution and accuracy for device fabrication. The asset is compliant with the industry-standard photoresist protocol and can support both negative and positive photoresist profile requirements. The model also offers the ability to perform both wafer-level and chip-level lithography, as well as multiple runs of the same pattern. LAM RESEARCH 4300 equipment ensures consistent and repeatable processing. The system has built-in data logging capabilities, which can be used to monitor process parameters and ensure uniformity, as well as to detect any out-of-tolerance conditions. In addition, the unit is outfitted with sophisticated, yet easy-to-use features that streamline the etching, lithography, and deposition processes. Overall, 4300 is an ideal choice for the fabrication of advanced semiconductor devices. With its high-resolution image processing capabilities, robust dispense unit, and advanced software suite, the machine can provide cost-effective solutions for the most demanding photolithography applications.