Used SEZ / LAM RESEARCH 4300 #293662196 for sale

SEZ / LAM RESEARCH 4300 is a photoresist equipment specifically designed to create submicron patterns on semiconductor wafers. It is a two-stage process that begins with photolithography, which focuses light onto a semiconductor wafer covered with a thin layer of photoresist. This process creates a pattern of exposed areas on the surface, which can then be developed and etched into the wafer's substrate. The second stage of the process, known as Post Exposure Bake (PEB), involves using heat to facilitate the formation of permanent patterns on the wafer. SEZ 4300 is a fully automated system featuring an advanced optical unit to ensure precise exposure of the photoresist on the semiconductor wafer. It utilizes a high-resolution reticle for photolithography to ensure extremely accurate patterning of circuit elements. It also features a unique venting machine that minimizes oxygen ingress to improve the surface contrast of the developed resist pattern. LAM RESEARCH 4300 is designed for high-precision applications, such as mask fabrication, optoelectronic devices, and microelectronics processing. It is equipped with the latest technology and statistical process control to ensure consistent wafer uniformity during the photoresist, development, and etching processes. It also features a user-friendly interface for easy operation. 4300 is a powerful photoresist tool designed for use in semiconductor fabrication. It provides high-precision patterning, excellent surface contrast of the developed resist patterns, and a simplified user interface for easy operation. This photoresist asset is an essential tool in producing intricate and advanced designs for semiconductor products.