Used SEZ / LAM RESEARCH 4300 #9211221 for sale

SEZ / LAM RESEARCH 4300 Photoresist Equipment is a high performance, large capacity, automated photoresist system designed for the deposition of photoresist and photomask materials. It is equipped with advanced features providing precision control of the photoresist process during deposition. The unit contains two independent processing chambers and provides advanced pre-treat, bake, and post-treat capabilities for a variety of photoresist and photomask materials. SEZ 4300 Photoresist Machine features a full-size 8" x 8" deposition chamber with a movable stage that allows for accurate and repeatable photoresist layer thickness. This stage can be operated manually or automatically using a computer control software package. The tool also includes a Linkam heating / cooling stage (LHS) that creates a uniform heating environment for optimal photoresist process control. LAM RESEARCH 4300 features a fully automated robotic arm for precise substrate handling and a closed-loop feedback asset for monitoring and control of the photoresist layer thickness. It also includes a standardized calibration model for precise calibration and precise control of the photoresist layer thickness. 4300 is also equipped with advanced process control instruments such as a laser beam profilometer for substrate flatness and surface roughness measurements and a mass spectrometer for online monitoring of the photoresist composition. SEZ / LAM RESEARCH 4300 equipment offers high throughput rates and high yield photoresist layers for a variety of substrates and substrates sizes. It is also compatible with a variety of photomask materials and can be used to control and adjust mask to substrate registration accuracy. The system includes a highly configurable user interface for easy integration with existing production environments. SEZ 4300 Photoresist Unit is an advanced, high performance photoresist deposition machine ideal for process development, production, and research applications. The tool offers precision control of the photoresist process during deposition and provides uniform deposition layers for both photoresist and photomask materials. With its advanced automation, closed-loop feedback, standard calibration asset, and built-in safety features, the model provides precise and reliable photoresist deposition with high throughput and yield rates.