Used SHANGHAI SSB300/30P #9358378 for sale

SHANGHAI SSB300/30P photoresist equipment is a highly advanced industrial photolithography instrument designed for photoresist imaging on a range of substrates. It is a fully automated, state-of-the-art system which consists of a range of components including a Core Real-time Processor (CRP) and an automated Supervision Unit (ASS). The CRP of the machine runs independent of the ASS, forming the core of the tool which is responsible for controlling and performing asset functions such as the processing, analysis and improvement of photolithography-related parameters. It executes all necessary operations autonomously and is capable of accurately positioning imaging components with high precision. The ASS isresponsible for monitoring and supervising all activities inside the model while constantly maintaining the integrity of the equipment. It can detect and address any unexpected changes, errors, or potential malfunctions within the system. The SSB300/30P can be used for a variety of photolithography processes such as spin coating, etching, and lithographic patterning. It can also be used for direct imaging applications, such as overlay metrology. It is equipped with a high resolution CCD detector array which reduces the impact of interference during the imaging process and enhances pattern definition and imaging quality. The SSB300/30P also has a continuous scanning mode which can capture two separate images at once, providing a more accurate image capture. The unit is highly versatile and is adaptable to different user needs. It is also equipped with advanced photolithography data management and analysis tools for monitoring the outcome of the photolithography process, and makes it easy to operate and maintain the machine with its user friendly interface. SHANGHAI SSB300/30P is an excellent photoresist imaging tool which provides superior performance and reliability compared to other systems. With its advanced capabilities and automated supervision asset, it is well suited for industrial use and can easily handle complicated and demanding photolithography processes.