Used SHINCRON BIS-1300CNN #9263768 for sale
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ID: 9263768
Vintage: 2008
Vacuum coater
(2) Cryo pumps
(2) EB Sources JEOL 270
Substrate heating
Crystal thickness monitor
Optical thickness monitor: OPM-Z1
RF Ion source: NIS-175
2008 vintage.
SHINCRON BIS-1300CNN is a precision photoresist equipment that provides superior etch profile control for modern-day wafer processing equipment. This advanced system features both chemical and laser resist processing capabilities, giving users the flexibility to process a variety of wafer types with a single unit. BIS-1300CNN utilizes a patented non-contact spraying method to precisely apply photoresist coatings across a variety of substrates, such as thin film transistors (TFTs), silicon wafers, and other related substrate materials. This non-contact process provides a uniform surface coating for consistent etch profiles and superior photoresist adhesion. The machine also offers precise control of solution spray pressure, enabling repeatable lithography and etch results. The advanced photoresist systems features a range of process parameters that can be easily adjusted to optimize coating for user-specific requirements. For instance, the operator can adjust variables such as external heating, material flow, solution spray parameters, substrate temperature, and dispense width to achieve desired processing outcomes. Additionally, the vendor-supplied software allows real-time process monitoring and control, reducing unnecessary downtime. SHINCRON BIS-1300CNN comes with a smartly designed cabinet that houses the tool's core components and software. Its compact design enables integration into existing cleanroom environments with minimal disruption. The asset also includes a variety of automated features that allow users to achieve repeatable, international results. These include a dynamic vessel model with automatic pressurized loading, flexible, dual-channel timing, and a self-regenerating magnetic filter equipment. BIS-1300CNN photoresist system offers users a reliable, efficient platform for wafer processing with repeatable results. Process set up is simple and straightforward and the integrated features allow users to easily control and adjust parameters for optimal processing. With its advanced performance levels and sophisticated features, SHINCRON BIS-1300CNN is the ideal choice for modern-day wafer processing needs.
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