Used SHINCRON NTC-780 #9395707 for sale

SHINCRON NTC-780 is a powerful photoresist equipment designed for a variety of uses. It is an invaluable tool for patterning integrated circuits and other electronic components. The system works by selectively exposing a photo-sensitive film (photoresist) to high-energy photons (light) which cause changes in the film's properties. NTC-780 uses a UV light source to expose the photoresist. This can be adjusted to have different intensities and time-exposures to create the desired resist patterns. The wavelength of the UV light can also be adjusted to determine the selectivity of the resist, allowing for the creation of multiple levels of photoresists on a single substrate. SHINCRON NTC-780 features an automated developing station which removes the exposed photoresist to create the desired photoresist pattern. This unit also boasts an automated cleaning station which removes any residual dust or particles before the etching process. The entire process is highly user-friendly and efficient, allowing for a higher level of precision than manual control methods. NTC-780 is also designed to ensure a consistent exposure of the photoresist. Its motorized stage machine allows it to quickly and accurately position the substrate for uniform exposure. This maximizes the efficacy of the exposure, ensuring that the photoresist is removed in areas where desired and left in areas where desired. This also keeps the etching process as efficient as possible, as the goal is to remove as much photoresist as possible without going overboard. SHINCRON NTC-780 also features a dust-free enclosure and air filter tool to protect the substrates from particles and other airborne contaminants during the exposure process. This helps to keep the resist patterns consistent and prevents any unwanted interference from the environment. Overall, NTC-780 is an invaluable tool for creating photoresist patterns. It features a variety of automated and manual controls which allow for precise exposure and etching of any substrate. Its dust-free enclosure and air filter asset also ensures that the photoresist patterns are always uniform and consistent.