Used SHINCRON RAS-1100C #293807624 for sale

SHINCRON RAS-1100C is a high-performance, light exposure equipment designed to develop photoresist on a variety of substrates. This system is equipped with a range of features that enable accurate and efficient exposure of complex photoresist patterns. RAS-1100C is powered by a 355 nm UV laser which is capable of both 1-dimensional and 2-dimensional scanning positions. This unit has a good resolution capability thanks to its digital linear encoders, making it suitable for high precision tasks. Additionally, the powerful laser allows for exposures of up to 200mils wide with a line width variation of +/- 2 mils. Moreover, the integrated vision machine in SHINCRON RAS-1100C ensures that intricate patterns are accurately replicated. RAS-1100C is designed to prevent substrate materials from being over exposed and distorted during light exposure. This tool is equipped with an effective light shutter asset that uses adjustable shutter lengths to control exposure times and minimize any distortion caused by light exposure. Furthermore, SHINCRON RAS-1100C's integrated wafer handling model can move up to six 25mm diameter wafers simultaneously without any cross contamination. This equipment can also be used for low volume exposure by removing the auto loading and unloading feature. In addition, this system is simple to set up and operate. It has a user-friendly console and requires minimal training to understand its functions. The console also displays a range of parameters which can be programmed and stored for future reference. To help maintain and repair your RAS-1100C unit, SHINCRON provides various support options. It offers both regional and international repair service, parts replacement and technical advice. It also has an online user manual which provides detailed information on how to set up and operate the machine. Overall, SHINCRON RAS-1100C is a reliable and efficient tool for developing photoresist on different substrates. Its directional shutter asset and wafer handling capabilities ensure that complex photoresists patterns can be accurately developed and exposed. This model is therefore ideal for those who need precise and undistorted light exposure for their projects.