Used SHOWA FA-7SRN #9119347 for sale

SHOWA FA-7SRN is a photoresist equipment designed for a wide range of applications to transfer micrometer features onto substrate materials. At its core, the system works by photolithography. Photolithography utilizes light to create layers or patterns on a substrate. FA-7SRN unit enables the etching and patterning of features across the substrate material. In order to do this, patterning is done in multiple steps. First, the substrate material is covered with a photoresist material. Then, a photomask is placed over the substrate which contains the desired feature pattern. Light is passed through the photomask and in turn exposes and hardens the photoresist material in the areas which will become part of the feature. It's important that the light is both strong enough and of the right wavelength to ablate the photoresist material accurately. Once the feature has hardened, it's then protected from any subsequent etching or water contact. An etchant is used to remove the photoresist covering the areas around the feature, exposing the substrate material. This process is done in layers, with additional photomasks used for each layer. Eventually, the full pattern is transferred onto the substrate material. SHOWA FA-7SRN machine utilizes advanced software and a powerful lamp to increase the speed and accuracy of the photolithography process. The tool also provides users with the flexibility to use different types of photomasks or create their own custom mask design. All of these features enable precise patterning which can be used for a wide variety of applications, such as fabricating printed circuit boards or microfluidic chips. Overall, FA-7SRN is a powerful tool that enables users to transfer micrometer-level features onto a variety of substrate materials. Its comprehensive features and advanced software make it an ideal tool for any application which requires precise patterning.