Used SIPREL TR 15 #9287735 for sale

SIPREL TR 15 is a special type of photoresist technology used for the development of microelectronic and MEMS devices. The technology consists of a combination of a strong, chemically resistant, and high-performance photosensitive resin and an advanced developer solution. The photosensitive resin used for TR 15 is formulated with proprietary additives and radiation-sensitive compounds. It exhibits excellent dry etching resistance, excellent adhesion to most substrates, and low shrinkage and UV reflections during the exposure process. The key feature of this resin is its high adhesion and exposure to radiation. This makes the photoresist equipment suitable for use in many different types of high-performance microelectronic applications. SIPREL TR 15 photoresist system is compatible with many common development solvents, including warm DI water, IPA, and NMP. The photoresist resists a wide range of non-volatile chemicals, including alcohols, petroleum distillates, and alkalis. The developer solution, which is insensitive to UV light and free of corrosion inhibitors, is formulated to deliver fast and high resolution development with minimal surface abrasion. The photoresist is compatible with most standard threshold curves and resists most types of acid, including hydrofluoric acid and sulfuric acid. The unit is also designed to give reliable lithography performance with high aspect ratios. Although the photoresist machine is highly compatible with a wide range of fabrication processes, it also exhibits superior performance in extreme environments, such as high temperature and stress situations. In terms of its photomask compatibility, TR 15 photoresist is designed to work with positive as well as negative photomask patterns. The results from the tool are consistent regardless of the radiation frequency or dosage used. Additionally, the asset offers improved adhesion and better resolution when exposed to different intensities of UV light. Overall, SIPREL TR 15 is ideal for applications that require high-performance photoresist systems. The technology offers excellent resolution, radiation resistance, dry etching resistance, and adhesion, as well as compatibility with a wide range of substrates and chemical treatments. As a result, the model is widely used in many microelectronic, MEMS, and other fabrication applications.