Used SITE SERVICES Tractrix XP #9080482 for sale

SITE SERVICES Tractrix XP is an advanced imaging equipment designed to provide users with accurate, high-resolution imaging of photoresist patterns. The system utilizes Tractrix XP imaging algorithm, which is specifically optimized for creating photoresist patterns of superior resolution and contrast. The unit utilizes a uniquely structured laser to generate a beam of coherent light that is scanned over the photomask to expose the polymer film during imaging. The laser beam creates a pattern that corresponds to the design of the photomask pattern. SITE SERVICES Tractrix XP machine utilizes advanced optics to optimize imaging configurations for photoresist patterns.These optics include a frame array, which is used to ensure that the beam is uniformly illuminated across the entire imaging field. The optics also include a laser aperture, which helps to minimize aberrations and allow for more accurate exposures. Additionally, the optics include a raster scanner, which is used to rapidly scan the laser beam over the photomask, ensuring precise alignment of the beam and the photomask. The imaging process begins with the polymer film being placed on a vacuum chuck. This vacuum chuck provides a stable platform for the polymer film during imaging. The frames array is then used to evenly illuminate the film, followed by the laser aperture being used to minimize aberrations. The raster scanner is then used to scan the laser beam over the photomask, and the exposure is completed. Once the exposure is completed, the photosensitive film is processed in order to create the desired pattern. The processing involves heating and cooling the polymer film, and agitation of the film in an appropriate solvent in order to etch away the exposed portions of the polymer film. The remaining portions of the film correspond to the design embedded in the photomask. Tractrix XP imaging tool is an invaluable tool for producing photoresist patterns of superior resolution and contrast. The asset's advanced optics and precise laser imaging capabilities allow users to create highly accurate patterns with little need for post-image processing. As such, the model is an essential tool for those working in a wide array of photoresist processes.