Used SOCUDO RF3S #9392387 for sale

SOCUDO RF3S is a type of photoresist equipment included in the Resist Embedded Core Evolver family of products used to create nano-style integrated circuits. This system is designed to work with chemically amplified positive resist mixtures. RF3S utilizes exposure sensitivity to enable resolution levels much finer than the typical commercial resist unit. The features of SOCUDO RF3S resist machine include producing features as small as 30 nanometers in resolution, excellent resistance to process variations, and significant image reversal in large area imaging applications. At the same time, RF3S tool also produces smooth sidewall profiles with excellent linewidth and edge linearity resolution. The exposure process of SOCUDO RF3S asset features a deep UV source and helps to minimize standing waves that can occur when mask features are exposed. This resist model is also designed with a high degree of transparency, which allows for a wider range of exposure intensities and layer thicknesses. This feature enables the design engineer to adjust the exposure time to get the desired resistance value in the resist layer. RF3S equipment can be used for both single and dual layer exposure processes in which multiple materials can be achieved in the same exposure process. This allows for significant attribute flexibility when it comes to achieving resistance profiles for a particular design. SOCUDO RF3S resist system is a top choice for manufacturers seeking to push the boundaries of chip manufacturing. It enables them not only to produce features as small as 30 nanometers, but to achieve and maintain precise resist profiles with an unparalleled level of consistency. Its excellent transparency also means that manufacturers can be confident that their designs have a consistent thickness across the entire chip. For these reasons, RF3S systems are widely used in the production of semiconductor chips for a variety of industries - from consumer electronics to aerospace and defense.