Used SOKUDO RF 310A #293626642 for sale
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ID: 293626642
Wafer Size: 12"
Vintage: 2012
Coater / Developer system, 12"
2012 vintage.
SOKUDO RF 310A is a customized product designed for photoresist and dry film photoresist application. It is a trustable and reliable equipment which is manufactured and developed by SOKUDO CORPORATION. RF 310A consists of a photoresist spray system, a primer unit, and a resist film applicator. The photoresist spray machine allows for superior performance in the coating process by giving consistent performance when compared to traditional manual or automated systems. The spray width of the tool is highly adjustable, allowing for both narrow and wide coverage of the substrate. Additionally, the asset is designed to minimize any unevenness within the surface of the coating. The primer model of SOKUDO RF 310A helps in protecting the surface of the substrate, improving adhesion and providing a better application for the photoresist. The primer can also be used to mask any exposed areas on the substrate. The resist film applicator is an automated equipment which, when coupled with the other two components of the machine, allows for a precise and consistent application of the photoresist into any size and shape of the substrate. The system uses a precise tension to accurately and effectively move the film along the surface of the substrate. This allows for very high quality results and offers uniform coverage across the entire substrate. RF 310A photoresist unit is highly reliable and efficient. Its features make it suitable for various types of applications. The machine is equipped with an easy to use user interface and enables easy monitoring of the entire process. It is designed for use with a wide range of photoresist films and products, as well as a variety of photoresist sprayers and primer systems. Additionally, the tool is designed to ensure safe and easy disposal of any waste generated. Overall, SOKUDO RF 310A photoresist asset is an effective and reliable tool for a wide range of applications. The model can help improve the accuracy of your photoresist application and the quality of the end product. Furthermore, it is equipped with a user-friendly interface and can be customized according to your specific needs.
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