Used SOKUDO RF3 #293609630 for sale

SOKUDO RF3 is a state-of-the-art photoresist equipment developed by SOKUDO Corporation for semiconductor fabrication applications. Photoresist is an essential material for the fabrication of various semiconductor devices. It is a type of photopolymer that undergoes a physical change when exposed to light at certain wavelengths. This enables it to be used as a mask to protect certain areas of a semiconductor surface from chemical etching and other processing steps. SOKUDO RF 3 photoresist system enables the accurate and precise application of photoresist on semiconductor wafers to create circuits with features down to the submicron range. RF3 unit is composed of two main components: a photoresist-coating machine and an exposure tool. The photoresist-coating asset is used to apply photoresist onto the wafer's surface. It can process wafers up to 200 mm in diameter and allows for precise application control through its wide range of dispensing and spray parameters. This ensures minimal waste and accurate uniformity of coating on the wafer. The exposure model is used to expose the photoresist-covered wafer to light. It is capable of maximum throughput, with powerful, automated functions that facilitate the exposure of complex pattern masks. It features X-Y positioning and angle adjustment, combined with LED and laser beam sources to enable dynamic exposure operations. These features enable fast and accurate exposure, with image resolution down to 10 nm. The combination of these two main components of RF 3 equipment enable the fabrication of submicron features on semiconductor wafers that meet the stringent requirements of today's device technologies. The system is highly reliable, with an ultra-low failure rate and excellent repeatability of results, making it an ideal choice for any high-precision device fabrication needs.