Used SOKUDO SK-3000 #9290521 for sale
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SOKUDO SK-3000 photoresist equipment is a reliable and accurate tool used to manufacture a wide range of products and components from a variety of substrates. This system helps to promote mass production of complex components and can be implemented for production of integrated circuitry, micromechanical parts and electrical devices. SK-3000 utilizes photolithography in its manufacturing process. This technique involves capturing a pattern or image within photo-sensitive material on the substrate. This is done by exposing the substrate to a high-intensity light source, creating a reaction which produces the desired pattern on the substrate. This process can reduce complexity and cost significantly during the manufacturing process. SOKUDO SK-3000 features a high-precision laser unit which is used to accurately project and align the pattern onto the substrate. It features a vacuum-based technique which ensures the accurate deposition of the photoresist onto the substrate. The patent-pending precision optics design of SK-3000 helps to ensure that the laser beam passing through it is highly focused and of the highest quality. The uniform and repeatable imaging results in an extremely accurate and consistent pattern on the substrate. The photoresist machine includes a control tool for precise and repeatable regulation of the exposure time of the laser. This asset also allows for the customized setting of the exposure time for the Laser in order to achieve optimal results. SOKUDO SK-3000 also features a high-resolution imaging and fault diagnosis model which ensures any flaw present on the substrate is identified and corrected accordingly. In conclusion, SK-3000 is an effective and reliable tool used in photolithography for automated manufacturing. It's optical equipment, in conjunction with the high-precision laser, ensures that the pattern presented on the substrate is of the highest quality and of the highest accuracy. It also features automated regulation and fault detection systems which assist in improving the accuracy and repeatability of the photoresist technique. All of these features make it a preferred choice in photolithography.
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