Used SOLITEC 5100 #9207415 for sale

SOLITEC 5100 is a precision resist coating equipment dedicated to photoresist processing. It is designed to provide superior uniformity and repeatability in thin-film photoresist coating and exposure, making it ideal for the production of advanced semiconductor devices. The robust system features an integrated filter wheel that enables precise thin-film coatings. The filter wheel enables precisely-controlled liquid delivery and dispersion, resulting in superior film uniformity. Additionally, the filter wheel helps to minimize solvent bleed during dispersion, which protects the substrate. The unit also offers automation for enhanced process repeatability and reliability. A closed-loop machine automatically adjusts the peristaltic pump speed, the filter wheel dispense angle, and the feature gap spacing. This helps to ensure that each coating is of consistent quality. 5100 is compatible with a variety of common lithographic materials, including materials such as developer and stripper solutions, as well as spin-on and spray-on photoresist coatings. The tool supports multiple coating pressure levels to accommodate different viscosity levels or material requirements. SOLITEC 5100 is equipped with automated scanning exposure technology, which enables high-quality exposure profiles and clear images. The asset offers high-contrast, high-resolution film image reproduction even at micron level accuracy. Additionally, power optimization ensures precise uniformity in thin-film photoresist coating and exposure. The model features an integrated temperature control equipment to ensure precise temperature regulation throughout the processing cycle. Additionally, an environmental enclosure is available to improve safety and the system can be equipped with a cooling jacket to protect the substrate from heat radiation. In summary, 5100 is an advanced resist coating unit designed for precision thin-film photoresist processing. Its robust design enables precise liquid delivery, uniform coating, controlled temperature, and consistent exposures. This makes the machine ideal for the production of advanced semiconductor devices.