Used SOLITEC 5110 PD #9101861 for sale

SOLITEC 5110 PD is a precision photoresist equipment designed for precision wafer processing. It features a unique three-dimensional exposing system, which allows for accurate exposure of small and complex photoresist patterns. The unit has a user-friendly graphical user interface, which makes it easy to use and set up for a wide variety of processes. The machine features a dual-decker optical alignment tool that makes sure exposures are accurately aligned to wafer patterns. A high-accuracy zooming asset allows for accurate exposure of even the smallest details. It also features a motorized focusing model which enables automatic focusing on wafer surfaces in order to guarantee a high-precision exposure. 5110 PD is engineered to be highly accurate and reliable. It has a wide range of temperature settings, ranging from -15°C to +50°C, which allows processing of the most sensitive wafers without compromising performance. Additionally, a combination of advanced hardware and software features, combined with advanced diagnostics, ensures equipment reliability and accuracy. Furthermore, SOLITEC 5110 PD also offers a unique level of flexibility. It features an optional multiple-target exposure station with a dynamic multi-stage exposure capability. This allows users to expose different portions of a wafer with multiple exposure systems in a single process step. The high-resolution imaging system built into the unit is designed to capture the finest details of Photoresist masks in high-resolution imagery. Additionally, it features advanced wafer profile measurement capabilities, which allow accurate estimation of wafer sizes, shapes, and edge geometry. In conclusion, 5110 PD is a highly reliable and accurate photoresist machine. Its combination of advanced hardware and software features, combined with a unique, three-dimensional exposing tool, make it an ideal choice for precision wafer processing. The multiple exposure station and dynamic multi-stage exposure capability add to the asset's versatility and flexibility, and the high-resolution imaging model allows for detailed imaging of photoresist masks.