Used SOLITEC 5110C #9043475 for sale

SOLITEC 5110C Photoresist Equipment is a fully integrated photolithography system for precision deposition and etching of chemical resistant polymers layers onto a substrate material. It is used for high-resolution pattern transfer and for active layer development. The unit is based on a large flat-panel digital imaging machine integrated with precision masks, a vacuum-based stage tool, and a unique dip-coating process. SOLITEC 5110-C asset is capable of simultaneous pattern transfer and etching of multiple layers. It is available in two defined configurations - the 5120S and the 5140C. The 5120S model is designed for a small number of layers, with chamber sizes up to 10"x10", while the 5140C equipment has increased size, with chamber sizes up to 60"x30". 5110C system is designed with a tightly integrated unit controller responsible for controlling the entire machine. This controller links the digital imaging tool with the stage asset. Additionally, it contains multiple algorithm controllers to ensure smooth operation by controlling the deposition process and other critical parameters such as etch rate, layer-thickness, substrate temperature, gas flow rates, etc. 5110-C model also includes a proprietary laser direct imaging (LDI) technology, which enables it to produce high resolution mask patterns. This is realized by a combination of LDI and photoresist processes. The LDIs are patterned by UV exposure using a high precision mask, then transferred onto the substrate by a vacuum-based equipment. SOLITEC 5110C provides for pattern transfer and structuring of patterns down to 50nm, providing an accuracte and repeatable photoresist pattern on each layer. The system also provides a high degree of edge definition and high pattern density, making it a highly reliable and cost-effective solution for production photolithography. In addition to producing a photoresist layer, SOLITEC 5110-C can be used for a large range of secondary processes, including chip bonding, polishing, and encapsulation, as well as for measuring the finished product properties. Overall, 5110C Photoresist Unit is a powerful and highly reliable solution for high-resolution photolithography that can be used in multiple substrates and thicknesses, making it an excellent choice for a variety of applications.