Used SOUTH BAY TECHNOLOGY / SBT IBSe DD #293706496 for sale

SOUTH BAY TECHNOLOGY / SBT IBSe DD photoresist equipment is a state-of-the-art system for producing fine-resolution, photolithographically patterned metallization layers and etched features on semiconductor devices. The unit's full name is Imaged By SRM Scanning Exposure (IBSe or IBSE) Direct Deposition (DD). SBT IBSe DD photoresist machine leverages a unique, three-point laser exposure technique that enables the accurate positioning of alignment marks, transparencies, masks, and images onto a substrate material. The three-point laser exposure technique is integral to the photolithography process and is based on Johannes Gutenberg's letterpress process. The three-point exposure strategy works to align and position the image together with the mask onto the substrate, creating the desired pattern. SOUTH BAY TECHNOLOGY IBSe DD photoresist tool is designed to be used with highly sensitive photoresist materials such as Shipley S1818 and AZ1518 along with other solder masks and primers. This asset features both automatic and manual substrate capability, automatic blade replacement, adjustable substrate orientation, and precision laser staging. To further enhance the accuracy of the exposure process, the model features an automated adjustment feature for edge-to-edge pattern scanning capabilities with ±1μm precision. To ensure durability, IBSe DD photoresist equipment is constructed from durable aluminum and steel alloys and is highly resistant to corrosion and high temperature fluctuations. All system components are designed for high vibration resistance, eliminating the need for regular preventative maintenance. Additionally, the unit features a built-in heating stage and temperature control for improved stability. SOUTH BAY TECHNOLOGY / SBT IBSe DD photoresist machine is widely used in semiconductor processing due to its high resolution imaging capabilities that enable the fabrication of complex lithographic patterns with exceptional accuracy. The tool's ability to perform with varying types of photoresist materials also makes it an attractive choice for a number of applications.