Used SPECIALTY COATING SYSTEMS / SCS PDS 2060PC #9028348 for sale
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ID: 9028348
Parylene deposition system
Includes:
2060V/PC base system
PDS 2060 mechanical chiller
PDS 2060 exhaust filtration
PDS 2060 9" chamber extension #1.
SPECIALTY COATING SYSTEMS / SCS PDS 2060PC is a general purpose photoresist system designed for advanced microelectronic device and interconnect processing. It is composed of a three-component solution comprised of a resin, an initiator and a solvent. The primary function of the photoresist is to act as a mask for lithography and etching of semiconductor materials, such as Silicon, Germanium or Gallium Arsenide. The resin is a cross-linked, water-soluble compound that acts as the primary etch resist. It is capable of withstanding both wet and dry etching processes used in microelectronics fabrication. The initiator is an organic compound which helps cross linking of the resin, further enhancing its etch resistivity. The solvent is used to thin the resin and initiator mixture for better coating onto the material. SCS PDS 2060PC photoresist system can be used for a wide variety of applications, including but not limited to, imaging UV/visible microstructures, creating electrical contacts, background masking, and patterning of thick films. With its ability to be applied and imaged in a single step, it allows for a quick and reliable process for device fabrication. The photoresist is easily developed and stripped, without the need of hazardous substances like hydrofluorocarbon, making it an environmentally friendly choice. The photoresist has excellent thermal stability, and it can be exposed with various spectral sources allowing for great control of the exposure. It is also exceptionally resistant to cracking or peeling when it is exposed to chemical cleaning agents. This optimizes the reproducibility of the process, making it ideal for creating reproducible device architectures. SPECIALTY COATING SYSTEMS PDS 2060PC photoresist system is versatile and highly efficient, making it a great choice for advanced microelectronic device processing. It is simple and reliable to use, making it an ideal choice for creating reliable and repeatable structures. Its ability to resist a range of dry and wet etching solutions makes it a great choice when working with multiple layers. Its environment friendly design ensures that the device fabrication process is efficient and safe to use.
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