Used SSC BPE-2708-SP #9150877 for sale

SSC BPE-2708-SP photoresistsystem is designed for high-quality photolithography applications. It is a highly developed liquid photoresist equipment that offers superior imaging and pattern transfer characteristics. The system utilizes a deep-UV chemically amplified, positive working photoresist that is designed for use with a variety of substrates, including silicon wafers. The unit combines advanced chemistry and lithography fabrication techniques to deliver superior results. BPE-2708-SP photoresist machine is composed of a liquid photoactive ingredient, or PAG, aDeveloper, aSurfactant, and aPolyol sensitizer. The tool is designed to work best when used together as a total process. The photoactive ingredient, PAG, is a non-volatile liquid that is typically associated with positive photoresist systems. It is composed of aromatic polymers and incorporated into a liquid medium. The PAG provides superior image resolution and superior sensitivity to the deep-UV light exposure. The Developer is designed to mask out areas from exposure and to project images onto the substrate. There are two types of developer available, aqueous and solvent based. Aqueous developer utilizes an acid-based solution and is excellent for higher resolution images on laminated substrates. Solvent based developer uses a base solvent and is recommended for superior etching processes. SSC BPE-2708-SP asset also utilizes a surfactant to solubilize the PAG. This surfactant helps the liquid photoresist flow smoothly and evenly to cover the substrate with uniform resolution and resists bubble formation. The solvent sensitizing Polyol is used to increase the solubility of PAG when exposed to the Developer. During the photolithography process, the photoresist is exposed to ultraviolet light for a predefined amount of time and with a predetermined intensity. The photoactive ingredient is activated by the UV exposure, and the developing process begins to create the desired pattern in the resist layer. After the substrate is fully exposed, it is washed with water or acidic solutions. The soluble material from the resist layer is washed away and reveals the pattern. BPE-2708-SP photolithography model is a superior tool for high-resolution circuit manufacturing. Its combination of fast, efficient imaging, superior sensitivity, and excellent etching characteristics make it an ideal choice for many fabrication requirements. This photoresist equipment provides the desired results quickly, reliably, and with minimal waste of material.