Used SSE Maximus 804 #293633410 for sale

SSE Maximus 804 is a reliable and user-friendly photoresist equipment designed for the application of photoresist materials in semiconductor and electronics components manufacturing. The system is capable of forming high aspect ratio features in an accurative manner. It utilizes advanced technology to produce superior quality images without the need of extremely fine details. Maximus 804 unit consists of three main components - exposing device, transfer device, and developing device. The exposing device is based on a digital-direct imaging (DDI) machine with a Laser Diode array that allows high speed imaging. The transfer device facilitates transfer of the images to the actual photoresist substrate via optical or thermal imprinting. The developing device is based on immersion or spray development procedure that can be adjusted for optimizing the imaging results for various photoresist materials. The tool is capable of working with a wide range of photoresist materials and can support various feature sizes from microns to millimeters in order to optimize processing parameters. It is designed for various lithography processes such as contact, stepper, projection and deep reactive ion etching (DRIE). With several operating modes, such as manual, semi-automatic, or fully automatic, the asset allows users to choose the mode that will be most suitable for their needs. SSE Maximus 804 model is also highly reliable and durable due to its high-quality components and construction. It features state-of-the-art micro-electro-mechanical systems (MEMS) based optical assemblies that are resistant against mechanical shocks, overheating and dust. With its powerful controller interface, the equipment is well-suited for industrial settings and ensure consistent performance over prolonged use. Overall, Maximus 804 system is an ideal choice for various photoresist application needs due to its reliable performance, advanced technology, and wide range of operating modes. It produces superior quality images and ensures accurative formation of high aspect ratio features. In addition, its user-friendly design, extensive options, and high reliability make it an attractive solution for smaller-scale production and large-scale manufacturing demands.