Used STEAG / MATTSON / AST Marangoni #9184982 for sale

STEAG / MATTSON / AST Marangoni photoresist equipment is a combination of chemical processes used to produce high-resolution images on a substrate via photolithography. Photolithography is a method of etching or otherwise transferring the shape of a mask to an underlying substrate by using light. AST Marangoni system performs this using a photosensitive resist. The resist is typically supplied as an aqueous solution of polymersized molecules suspended in a liquid medium. When exposed to light, the molecules become cross-linked and form a polymeric film deposited on the substrate. This film is very resistant to both chemical and physical properties, and is capable of defining a pattern. STEAG Marangoni unit utilizes three separate stages, each of which works to maximize the image resolution when creating the underlying pattern. In the first stage, an etching solution such as hydrofluoric acid is applied to the substrate. This solution works to modify the surface of the substrate and form microscopic pits. This first stage provides the necessary roughness for the subsequent photolithography steps to adhere. In the second stage, the photoresist is applied to the substrate and allowed to flow. This stage is important for creating a uniform layer on the substrate. MATTSON Marangoni machine utilizes a combination of surface tension and diffusion to ensure the photoresist completely adheres to the substrate. In the final stage, the photoresist is exposed to light using a configured mask. This is where the photoresist is exposed and reacts with the light to initiate the cross-linking of the molecules. Marangoni tool utilizes a combination of high resolution optics and computer-controlled alignment devices to ensure the mask is properly aligned. Once the cross-linking is complete, the cross-linked molecules form a uniform layer on the surface. This retains the pattern from the mask and provides a uniform image on the underlying substrate. Following this process, the pattern is further developed by using wet-etching to remove the photoresist in the unwanted areas. STEAG / MATTSON / AST Marangoni photoresist asset is a highly specialized and effective photolithography technique that produces reliable and accurate images on a wide range of substrates. It utilizes three distinct stages to ensure a uniform layer of photoresist on the surface. Additionally, it utilizes high-resolution optics to ensure the mask is properly aligned. This model has been proven to be a reliable and effective photolithography technique and is widely used in the electronics industry.