Used STEAG / MICROTECH ElectroDep 2000 #9298678 for sale

STEAG / MICROTECH ElectroDep 2000 is a high-performance photoresist equipment designed for precision electroforming technologies. Utilizing ultraviolet light sources, the system allows for the accurate and delicate etching of metal surfaces as part of a template unit. STEAG ElectroDep 2000 is designed to be user friendly and flexible enough to deal with a wide range of products. MICROTECH ElectroDep 2000 is composed of the standard elements of a photoresist machine: a light source, masking imaging projection optics, and a power supply. The UV light source produces highly accurate light patterns that are accurately aligned with the template through various optics and mirrors. These light patterns are then used to precisely etch the substrate in order to create a desired shape. The power supply is used to regulate the current output needed to achieve the correct etching depth. In addition, a motorized stage stage is used to move the substrate into the proper position and maintain alignment with the desired pattern mask. This allows for precise pattern placement with no manual adjustment or stage straining. Further allowing for precise pattern creation, a precision auto focus tool constantly measures the substrate position with respect to the pattern and adjusts the pattern mask accordingly. ElectroDep 2000 offers a number of optional features that make it ideal for precision electroforming. The UV light source can be upgraded to include intensity control and variable pulse length. In addition, the auto focus asset can be programmed to switch quickly between different pattern masks to increase manufacturing efficiency. Furthermore, a variety of imaging lenses are available for the imaging projection optics to cover all possible pattern applications. STEAG / MICROTECH ElectroDep 2000 provides a high-performance and reliable platform for precise electro forming technologies. With its highly accurate pattern production and precise motorized stages, it is an ideal model for ultra-precision pattern and etching applications.