Used SVG 81 #9302570 for sale

SVG 81 is a photoresist equipment developed to enable the performance of a variety of device production processes. The system was designed specifically to allow etching, planarization, and trenching among semiconductor wafer materials such as silicon, gallium arsenide, tungsten, and polysilicon. 81 operates by exposing a photoresist layer on a surface to a rapid UV radiation generated by a highly specialized light source. This UV radiation serves to create chemical changes in the molecule of the photoresist, making possible to build layers of different thicknesses in order to achieve the desired pattern on the surface. After exposure to the UV radiation, the wafer is transferred to the etching chamber, where an appropriate etchant is used to remove the less-crosslinked material. Once the desired pattern is created, a post-etch dry cleaning step is used to remove any residues or particles left over from the etching process. SVG 81 unit also provides the capability to deposit a planarizing layer on the exposed wafer in order to obtain a more uniform surface. This makes possible the generation of smoother surfaces and more reliable devices. Additionally, 81 allows for the attainment of holes or trenches of different sizes and shapes based on the ultraviolet radiation exposure intensity applied. SVG 81 machine is composed of several major components. These components include the photocathode power supply, the light source, the imaging tool, and the environmental controls. The photocathode power supply acts as a power source for the special ultraviolet radiation needed to create the photoresist pattern. The light source is used to supply the needed UV radiation, while the imaging asset controls for the uniformity of the pattern across the entire wafer. Finally, environmental controls adjust for temperature and density. 81 model has multiple advantages. The equipment is reliable, cost-effective, and energy efficient. Furthermore, the process is non-intrusive, meaning that it does not take away from the other processes such as etching and planarization. Finally, SVG 81 is compatible with a wide range of wafer materials, making it a widely-used system.