Used SVG 8126 #9123208 for sale

SVG 8126
Manufacturer
SVG
Model
8126
ID: 9123208
Resist coater Spin station Hotplates not included.
SVG 8126 is a commercial-grade photoresist equipment. It is a specially developed system made from acrylate materials and designed for a variety of photolithography needs. The unit is comprised of a range of components, such as a photoresist, a photomask and developer. Photoresist is a product used to create patterns on a substrate by selectively blocking the exposure to a light source. The photoresist used with 8126 machine is a low-cost, acrylate-based material that allows for increased resolution and yields of etched products. The resistivity of the photoresist is adjustable, allowing designers to achieve the desired effect. The photomask is a transparent sheet of material used to block certain areas of the substrate from being exposed during the photolithographic process. The photomask used with SVG 8126 tool is made of high-transmission material and boasts high image contrast and resolution. The developer (along with the photomask) is used to form the photoresist layer on the substrate. The developer used with 8126 asset is a chemical developer that helps create the resist layer by activating the acrylate material in the photoresist. The photolithography process itself is a series of steps that begins with pre-treatment of the substrate (i.e. the material to be patterned). This includes etching the substrate in a specific way to prepare it for the next step. Next, the photoresist (along with the developer) is applied over the substrate. After this, the photoresist layer is exposed it to light using the photomask pattern. Once cured, the photoresist layer will become insoluble, allowing it to create a pattern on the substrate. Finally, the substrate is etched according to the design patterns set in the photoresist layer. SVG 8126 model is highly praised for its consistent results and high degree of accuracy. Its acrylate-based photoresist provides excellent adhesion and adhesion properties. The photomask provides high-transmission rates and excellent image contrast. Its chemical developer ensures an even and complete pattern on the substrate. Overall, the equipment promises consistent results that adhere to exacting standards.
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