Used SVG 8126 #9132286 for sale

SVG 8126 is a photoresist system developed by Shipley Company, Inc. It is an industry-standard vacuum-channeled photoresist that is used in photolithography as a protective layer during an etching or plating operation. The unique properties of 8126 help create the desired shape of the resist pattern on the substrate. SVG 8126 has a high viscosity, which is beneficial for making accurate patterns on substrates. In addition, the resist is insoluble in alkaline solutions and resists etching. This makes it suitable for applications that require resistance to high temperatures or etching processes, including deep angle or critical line exposure. The resist is composed of polycyclooctene (PCT) as the base material, which provides excellent adhesion and chemical resistance properties and makes it ideal for high-resistance etching and plating processes. 8126 system also has a liquid encapsulant that forms a protective barrier between the resist and substrate. This is especially true during deep angle and critical line exposure. SVG 8126 can be applied to one or multiple substrates at a temperature range of 100°C to 250°C. The resist can be cured by either UV light exposure or by temperature. This makes it suitable for a range of applications including vias, microcircuits, and non-directional etching. The resist can be easily removed by both chemical and mechanical methods. The chemical removal uses a sulfuric or hydrochloric acid solution, while the mechanical removal uses an inert abrasive like sand or glass bead. Finally, the resist must be removed from the substrate in a thorough rinsing step. In summary, 8126 is an industry-standard vacuum-channeled photoresist designed for use in high-resistance photolithography processes. It has excellent adhesion and chemical resistance properties. It can be exposed to a range of temperatures and with either UV light exposure or by temperature. The resist is easy to both chemically and mechanically remove, and it is suitable for applications that require resistance to high temperatures or etching processes.