Used SVG 8128PD / 8136HPO #9110475 for sale
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ID: 9110475
Wafer Size: 4"
PMMA Develop track, 4"
Includes:
SVG 81 Tracker
Chlorobenzene cabinet
ABM UV hood with exposure control box, (2) UV filters, and some manuals
ABM UV hood is meant for a 1000 W mercury bulb
Missing bulb itself and bulb power supply for ABM UV.
SVG 8128PD / 8136HPO equipment is a photoresist system used in a variety of different fields, from electronics to graphics, for fabricating circuits, devices, and patterns on a variety of substrates. The primary components of the unit are SVG 8128PD photoresist processor and SVG 8136HPO photoresist developer. SVG 8128PD is a compact automated processor that automates the entire photoresist processing process, from spin-coating and prebake to post-exposure bake and etching. The machine provides uniform photoresist spin-coating, excellent image quality, minimal line width variation, and precise control over the exposure process. SVG 8136HPO photoresist developer is a water-soluble photoresist developer designed to provide uniform film development and fast, high-quality photoresist stripping. The tool utilizes hydroxyl freezedrying of the photoresist, which minimizes the amount of chemical residue left on the substrate. Both of these components are designed to provide precision and accuracy in the photolithography process of modern electronics fabrication. SVG 8128PD and SVG 8136HPO photoresist systems provide an automated method of fabricating intricate circuits, devices, and patterns on a variety of substrates. The systems are designed to provide precision and accuracy in the photolithography process, ensuring that the desired patterns and circuitry are accurately transferred to the substrate. The systems are also designed to reduce time involvement in the photolithography process, reducing labor and production costs. Additionally, the systems provide good line width control and image quality, resulting in reliable functionality of the device. Overall, SVG 8128 PD/8136 HPO photoresist asset is an efficient and cost-effective solution for fabrication of intricate circuits, devices, and patterns on a variety of substrates. The model provides uniform film development and spin-coating, excellent image quality, minimal line width variation, and precise control over the exposure process. The automated processing and fast, high-quality photoresist stripping save time and money in production and ensure reliable and accurate results.
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