Used SVG 8136 #9396684 for sale

SVG 8136 is a high-performance photoresist designed for advanced lithography processes such as double patterning and immersion lithography. 8136 is a negative tone resist that is formulated with a proprietary blend of polymers and additives to provide superior resolution, uniformity and processing stability. Through the use of innovative technology, SVG 8136 photoresist enables double-patterning processes to achieve sub-100nm feature resolution. The resist is designed to be highly filmable and ensures excellent wet process uniformity, enabling developers to fabricate intricate structures accurately and reliably. The polymer blend is designed to provide improved water resistance and ensure excellent mechanical performance throughout the lithography process. The resist can be used with chemicals such as isopropyl alcohol and acetone to develop features quickly and efficiently. The refined formula of the resist helps to minimize chemical resist-loss, resulting in reliable imaging performance for advanced applications. Another benefit of using 8136 photoresist is that it is designed to reduce contamination and minimize particle generation during post-processing. The resist features a jacket-like organic layer that ensures low particulates, reduced contamination and provides reliable patterning of demanding patterns. In general, SVG 8136 photoresist is designed to provide advanced lithography processes with optimal resolution, uniformity, and processing stability. The resist is highly filmable, water-resistant and has low particle generation, making it suitable for use in advanced device fabrication applications. By providing excellent imaging performance and reliable post-processing benefits, 8136 photoresist can enable developers to produce more precise and intricate structures with greater accuracy and precision.