Used SVG 86-3 #117950 for sale

Name: SVG 86-3
Brand: SVG
SKU: 117950
Availability: InStock

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Photoresist

Manufacturer

SVG

Model

86-3

ID: 117950

Wafer Size: 3"

single cabinet developer system, 3" Configuration: Wafers: 3" round Silicon wafers, convertible up to 6" with kit option Process flow: left to right Track 1: send, HMDS vapor prime, chill, coat, bake, chill, receive Track 2: send, bake, chill, MD develop, bake, chill, with flood expose, receive System specifications: Frame: Internal frame: standard powder coated black External panels: stainless steel System: Emergency stop access in front of system Rear system bulkhead fittings and facility connections: Process chemicals: EBR solvents, developer, DI water Process gasses: clean dry air, Nitrogen Process exhaust Cooling water System transport: O-ring belt transfer Polyurethane Silicone Viton Serial processing Indexer module: Platform designed for SEMI standard 3" wafer cassettes Hard anodized aluminum Standard 3" SEMI standard cassette pitch indexing Capable of handling up to 6" SEMI standard wafer cassettes Photoresist coat module: Arc centering configured for 3" round silicon wafers Brushless motor: 1 RPM spin speed programmability up to 6,000 RPM Programmable pivoting moving dispense arm: (1) Photoresist nozzle (3) Topside EBR TEFLON catch cup with built-in backside EBR Pre-dispense cup with programmable pre-dispense Digital vacuum switch Interlocked safety cover to stop process when removed Center collection 1 gallon polyethylene drain container, high level sensor 5-gallon SS canister with low level sensing for EBR solvent dispense Positive resist moving dispense developer module (aqueous) Arc centering configured for 3" round silicon wafers Brushless motor: 1 RPM spin speed programmability up to 6,000 RPM Programmable pivoting moving dispense arm: (1) 1/4” O.D. developer nozzle (1) 1/4” O.D. DI water rinse nozzle (1) SS11001 developer spray nozzle (1) SS11001 DI water rinse nozzle Polyethylene catch cup with built-in arm home positioning off wafer Digital vacuum switch Interlocked safety cover to stop process when removed 2" Polyethylene drain to rear of system for facility connection 5-gallon SS canister with low level sensing for aqueous developer Chill plate module: Hard anodized aluminum surface Internal water channels for high efficiency heat transfer 3/8" Swagelok tubing input and output connections Hotplate oven module: Hard anodized Aluminum 3-pin HPO block assembly 3-pin stepper motor programmable wafer lift handling Enhanced heating element (Std. 120V, 450W) Optional enhanced heating element (High Temp. 120V, 750W) WATLOW temperature controller Auto tuning +/- 0.1% calibration accuracy Temperature range: 50ºC to 250ºC (Standard) Temperature range: 80ºC to 350ºC (High Temp.) Temperature uniformity: +/- 0.5ºC (at 100 ºC) Digital LED display Temperature readout to 0.1ºC RTD temperature probe Digital vacuum switch NetTRACK system manager: NetTRACK CPU board Industrial PC Multitasking Windowsxp application software HCIU card cage connection port NetTRACK system management software Recipe management Unlimited recipe writing Easy editing and copying Component exercise Real-time display of process set points Real-time processing data logging Four access security levels with password control Seamless integration with production server Configurable for all process steps SECS-GEM compliant ports print out in MS Excel format 15” ELO color touch-screen, 1024 x 768 resolution at 75 Hz Ergotron monitor arm, (angles and height adjustable, SEMI compliant) Emergency stop button front Main breaker on power distribution box Barcode reader Flood exposure: Configured for 3" wafers (4" shutter opening) Lamp: 350W Wavelength: 365 nm Intensity range: 18mW to 24mW Module mounted on developer chill plate Exposure interface board to system software control Facilities requirements: Power (system): 208V, 3-phase, 60Hz, 5-wire, 35A Power (chiller): 120V, 1-phase, 60Hz, 3-wire, 15A Vacuum: 5 SCFM at 28" Hg, 3/8" OD tube Gas (CDA): 70 to 100 psig, 10 SCFM per system, 1/4" OD tube Gas (N2): 80 to 100 psig, 10 SCFM per system, 3/8" OD tube Process exhaust (coater/developer): 35 SCFM at 1.5" H2O/module, 4" duct Process exhaust (HPO): 10 SCFM at 1.5" H2O/module, 4" OD duct Cabinet exhaust (optional): 150 SCFM at 1.5" H2O, 4" OD duct Facilities connections: back of system System transport and installation: Transport: 4 wheels Securing: screw type mounting feet with pads Dimensions (W x D x H): 96 x 40 x 48" Options available for an additional cost: (Qty 4) IntelliGen Mini Photoresist dispense systems: 2-Stage Steppor motor technology and diaphragm design Filter Mounting bracked Interface cables (Qty 2) IntelliGen HV Photoresist dispense systems: 2-Stage Steppor motor technology and diaphragm design Filter Mounting bracked Interface cables (Qty 4) 451-15-1-S IDS 1/4 x 1/4 units with suckback valves: Bushings and compression nuts for input and output connections (1) output 0 to 15 PSI pressure For resist (0-80cp), Barli, and ARC (0-80cp) Power supply Interface cables Software (Qty 2) CYBOR 7500 precision chemical dispense pumps: Mid-range viscosity: 300 cp to 3000 cp 3/8" Flare-type connections KALREX O-rings Variable rate dispense High-torque stepper motor control Dispense volume: maximum 16ml Programmable suckback Multiple recipe select On-board single-pump controls RS232, RS485, LON communications Power supply Interface cables Software Chill plate closed loop temperature control unit: Connection tubing Can be shared with more than one chill plate Developer temperature control unit: Closed loop recirculation heater / chiller Manifold and connection tubing to dispense arm Single temperature delivered to dispense arm Electro-polished 5-gallon SS solvent canisters, low-level sensing Dual chemistry developer dispense system.

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SVG 86-3 is a process of photolithography which uses a photoresist material to transfer a pattern from a photomask onto a substrate. It is a positive-type, no-volatile liquid photoresist equipment with a UV-light based imaging process. 86-3 photoresist consists of a polymeric binder system and a photosensitive component. The photosensitive component contains sensitizers, quenchers, acid generators, and solvents. The polymeric binder unit contains polymers such as polyvinyl alcohol, styrene, butadiene, and acrylate. The imaging process of SVG 86-3 photoresist is activated when irradiated with UV light. This process is driven by a reaction between the photosensitive component and the polymeric binder machine. The UV-light electromagnetic radiation activates quenchers and prevents sensitizers from transferring energy from the light to the binder tool. This is known as "quenching". The acid generator also reacts with the UV-light and converts to an acid which generates a catalytic reaction that causes further degradation of the binder asset. When the photoresist is irradiated, the binder model becomes insoluble and is open to removal by a developing solution. The insoluble material then acts as an etch-resistant barrier and protects the underlying layer against etching. On the other hand, the non-irradiated areas retain the initial solubility; they are removed by the developing solution, leaving an exposed underlying patterned layer. 86-3 photoresist is compatible with a wide range of substrates including metal and semiconductor surfaces. It is also suitable for use in typical metal etch solutions and solutions used for dry etching processes. Furthermore, this photoresist can be used with a variety of etching processes such as wet etching, plasma etching, and oxygen-plasma ashing. In addition, SVG 86-3 is a low-temperature, solvent-resistant equipment. The low-temperature curing process helps reduce cost and plant loading, while the solvent resistance prevents cross-contamination between the resist and the substrate materials. The resist can be removed with conventional resist strippers and solutions. The resist system also provides excellent adhesion to various substrates, including gold, aluminum, stainless steel, and silicon wafers. 86-3 unit is an economical, efficient and reliable photoresist technology for a variety of applications. It offers high resolution and is suitable for a wide range of substrate materials and etching processes. It is also a low-temperature, solvent-resistant machine which ensures that the substrates maintain their integrity throughout the photolithography process. SVG 86-3 photoresist is an excellent choice for patterned layers and provides a reliable, low-cost production process for fabricating complex parts and designs.