Used SVG 86 #9163180 for sale

Manufacturer
SVG
Model
86
ID: 9163180
Wafer Size: 6"
Double coater, 6" Semi flat wafers Cassettes: Fluor ware Coater wafer direction: Left to right Coater with MYKROLIS IntelliGen 2 Pump Coater exhaust with auto-damper Hardware: SMC Digital vacuum sensor Coater bottom EBR with flow meter Does not include: Coater with catch-cup-rinse Thru-track interface to pe micralign riro MICROBAR chemical cabinet CTD CTR Vacuum bake wafer prime Coater spinner with servo pack Coater dispense line with flow meter Coater top EBR with flow meter Coater catch-cup-rinse with flow meter ADS Resist reservoir system No automation Power supply: 415 VAC, 3 Phase 2010 vintage.
SVG 86 is a photoresist equipment developed by Silicon Valley Group (SVG) for use in the semiconductor industry. It is a single-photo, flowable resist that provides excellent printing results, with reliable edge resolution and exposure latitude. The system consists of a photoresist material, an image mask, a photoresist developer solution, and a chemical treatment unit. In use, the photoresist material is applied to the surface of a semiconductor wafer and exposed to ultraviolet (UV) light from the image mask. The light causes certain portions of the resist to dissolve, while others remain intact. The remaining portions form the pattern that will be transferred onto the wafer. 86 is designed to produce high-resolution images with a consistent thickness of material and uniform edge resolution. It has a low light sensitivity, meaning that it can be exposed to high-intensity light while still producing a clean, precise image. The resist also has excellent chemical resistance properties, and is resistant to bleaching, corrosion, and etching. SVG 86 is used in many different semiconductor fabrication processes. It is used to create a range of components such as microelectromechanical systems (MEMS), microcontrollers, and integrated chipsets. It is also used in the production of photoresistors, thin-film transistors, and light-emitting diodes (LEDs). Additionally, it is used to pattern solar cells and photovoltaic cells. The machine is well suited for high-volume and high-precision fabrication. It is commonly used in the fabrication of advanced materials, such as strained silicon, germanium, compound semiconductors, and nanostructures. The tool is easy to use, and requires minimal operator training. 86 is designed to be an affordable photoresist solution that is suitable for a wide variety of semiconductor applications. It is highly reliable, with low defect rates and high yields. This makes it ideal for high-volume production, and enhances the reliability and performance of the finished device.
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