Used SVG 86 #9181739 for sale

SVG 86 is a "photoresist" equipment for use in lithographic microchip design and manufacture. It is a bi-layer film system; the first layer is a photoresist which is more sensitive to exposure from high-energy light sources such as ultraviolet (UV) or deep-ultraviolet (DUV). The second layer is an anti-reflection (AR) layer which helps to reduce or eliminate distortions caused by reflections. 86 unit consists of a special combination of polymers photoresists. This combination forms a complex resist machine with superior adhesion to the substrate and high resolution. The combination not only increases the resolution of the image, but also reduces its sensitivity to variables, such as the moisture, temperature, and the chemical environment, which are often present during the lithographic process. SVG 86 tool has been optimized for patterning of advanced microelectronic devices. As such, it uses a combination of screenable positive and negative resists to obtain the highest resolution at the lowest levels of sensitivity and reflectance. 86 photoresist asset is suitable for a variety of exposure sources, including ArF excimer laser and DUV excimer sources. The main advantage of SVG 86 model is that its high resolution and low sensitivity are maintained even in the presence of environmental and physical variables, such as, moisture, temperature and chemical environment. This is due to the special properties of the combination of resists used in the equipment. Additionally, when compared to other resists, 86 offers improved adhesion of the resist to the substrate, as well as improved adhesion of the patterned metal layer. SVG 86 system also has the capacity to produce uniform thin film profiles, with low feature heights and low CD variation. The uniformity helps to create consistent structures at the nanoscale level. The improved adhesion of the resist layer to the substrate helps to reduce the risk of flaking, peeling or cracking during the next patterning stage. In addition, 86 unit can also be used for challenging "stepper" applications, which require high-resolution imaging at high dielectric values. The patterned layer can be optimized to increase the flux of the illuminated area while allowing for sharper features and better patterning. Overall, SVG 86 machine is a highly advanced photoresist tool designed to produce accurate lithographic microcircuits with excellent adhesion to the substrate and with fine features and high resolution. Thanks to its combination of highly complex polymers, 86 is a reliable and cost-effective asset for producing small and high-resolution electronic devices.