Used SVG 8626 #9396687 for sale

SVG 8626 is a photo-resist equipment developed by SVG Chemicals that is designed for use in the manufacture of advanced photomasks. The system is comprised of a proprietary photoresist formulation, a novel photomask-manufacturing process, and a three-layer plating technique. The photoresist formulation in 8626 is designed to produce very thin layers of resists with excellent resolution capabilities. The resist formulation enables photomasks to have smaller features, higher aspect ratios, and improved via-filling capabilities while also improving resolution of fine and ultra-fine features. This resist also allows for lower image distortion during plating due to its high uniformity and viscosity consistency. The unique photomask-manufacturing process in SVG 8626 uses photoresist along with refractive index-matched coverites to create photomasks. The process is characterized by a three-layer plating technique, which ensures accurate tolerances for features, resulting in improved image resolution and lower yield losses. The first layer of the process is the photomask, which is used to define the pattern of the photomask. Light is applied to the photomask and it is exposed to a photosensitive material, such as photoresist. The second layer of the process is the posites, which are used to improve the uniformity of the photomask and to improve dimensions of via-fills. The third layer is the protective layer, which protects the photomask from environmental and thermal stresses. Overall, the photomask-manufacturing process of 8626 results in photomasks with high resolution, reduced image distortion, improved via-filling performance, and improved yield losses. Furthermore, lower thermal and environmental stresses during processing helps extend the lifetime of the photomask and prevents corrosion. SVG 8626 photoresist unit is therefore an advanced and reliable photoresist machine for use in the manufacture of photomasks.