Used SVG 8632 #9396691 for sale

SVG 8632 is a photoresist system used for optical lithography processes, specifically for 28nm imaging and finer. It is composed of a positive tone imageable, direct-write proprietary organic sol-gel resist and a solvent-based positive tone developer. The photoactive component of the resist is robust in the presence of EUV and Deep-UV radiation, enabling the resist to be exposed to very short wavelength radiation for fine-detail resolution. The resist itself is composed of a non-ionic polymer and a heterocyclic triderivative that when coated on the wafer can form a high quality image pattern. Much of the more conventional acid catalyzed resists have a limitation in their resistivity to certain pollutant species such as large molecular species or dioxides. The sol-gel resist of 8632 however is highly resistive to such pollutants making the resist highly durable and enabling it excellent imaging characteristics. To develop the resist SVG 8632 developer is utilized. It is based around an organic amine compound which once activated can act on the sol-gel exposed resist regions to remove the exposed parts and leave behind the unexposed areas. This process enabled fine, accurate patterning of the wafer to be formed. 8632 is an excellent resist system that has been designed with high resolution processes in mind. Its unique sol-gel resist composition enables high sensitive and accurate imaging of feature sizes down to 28 nm and beyond, much better than regular lithographic resists. Additionally its robustness to air and pollutant contamination make the resist highly durable and suitable to high volume production.