Used SVG 88-3 #117937 for sale

Name: SVG 88-3
Brand: SVG
SKU: 117937
Availability: InStock

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Photoresist

Manufacturer

SVG

Model

88-3

ID: 117937

Wafer Size: 3"

single cabinet 2-track vapor prime / coat / bake system, 3" Configuration: Wafers: 3" round Silicon wafers, convertible up to 6" with kit option Process flow: left to right Track 1: send, HMDS vapor prime, chill, coat, bake, bake, chill, receive Track 2: send, HMDS vapor prime, chill, coat, bake, bake, chill, receive System specifications: Frame: Internal frame: standard powder coated black External panels: stainless steel System: Emergency stop access in front of system Rear system bulkhead fittings and facility connections: Process chemicals: EBR solvents, developer, DI water Process gasses: clean dry air, Nitrogen Process exhaust Cooling water System transport: Polyurethane Silicone Viton Automated transfer arm Serial processing Indexer module: Platform designed for SEMI standard 3" wafer cassettes Hard anodized aluminum Standard 3" SEMI standard cassette pitch indexing Capable of handling up to 6" SEMI standard wafer cassettes Photoresist coat module: Arc centering configured for 3" round silicon wafers Brushless motor: 1 RPM spin speed programmability up to 6,000 RPM Programmable pivoting moving dispense arm: (1) Photoresist nozzle (3) Topside EBR TEFLON catch cup with built-in backside EBR Pre-dispense cup with programmable pre-dispense Digital vacuum switch Interlocked safety cover to stop process when removed Center collection 1 gallon polyethylene drain container, high level sensor 5-gallon SS canister with low level sensing for EBR solvent dispense Positive resist moving dispense developer module (aqueous) Arc centering configured for 3" round silicon wafers Brushless motor: 1 RPM spin speed programmability up to 6,000 RPM Programmable pivoting moving dispense arm: (1) 1/4” O.D. developer nozzle (1) 1/4” O.D. DI water rinse nozzle (1) SS11001 developer spray nozzle (1) SS11001 DI water rinse nozzle Polyethylene catch cup with built-in arm home positioning off wafer Digital vacuum switch Interlocked safety cover to stop process when removed 2" Polyethylene drain to rear of system for facility connection 5-gallon SS canister with low level sensing for aqueous developer Chill plate module: Hard anodized aluminum surface Internal water channels for high efficiency heat transfer 3/8" Swagelok tubing input and output connections Hotplate oven module: Hard anodized Aluminum 3-pin HPO block assembly 3-pin stepper motor programmable wafer lift handling Enhanced heating element (Std. 120V, 450W) Optional enhanced heating element (High Temp. 120V, 750W) WATLOW temperature controller Auto tuning +/- 0.1% calibration accuracy Temperature range: 50ºC to 250ºC (Standard) Temperature range: 80ºC to 350ºC (High Temp.) Temperature uniformity: +/- 0.5ºC (at 100 ºC) Digital LED display Temperature readout to 0.1ºC RTD temperature probe Digital vacuum switch NetTRACK system manager: NetTRACK CPU board Industrial PC Multitasking Windowsxp application software HCIU card cage connection port NetTRACK system management software Recipe management Unlimited recipe writing Easy editing and copying Component exercise Real-time display of process set points Real-time processing data logging Four access security levels with password control Seamless integration with production server Configurable for all process steps SECS-GEM compliant ports print out in MS Excel format 15” ELO color touch-screen, 1024 x 768 resolution at 75 Hz Ergotron monitor arm, (angles and height adjustable, SEMI compliant) Emergency stop button front Main breaker on power distribution box Barcode reader Flood exposure: Configured for 3" wafers (4" shutter opening) Lamp: 350W Wavelength: 365 nm Intensity range: 18mW to 24mW Module mounted on developer chill plate Exposure interface board to system software control Facilities requirements: Power (system): 208V, 3-phase, 60Hz, 5-wire, 35A Power (chiller): 120V, 1-phase, 60Hz, 3-wire, 15A Vacuum: 5 SCFM at 28" Hg, 3/8" OD tube Gas (CDA): 70 to 100 psig, 10 SCFM per system, 1/4" OD tube Gas (N2): 80 to 100 psig, 10 SCFM per system, 3/8" OD tube Process exhaust (coater/developer): 35 SCFM at 1.5" H2O/module, 4" duct Process exhaust (HPO): 10 SCFM at 1.5" H2O/module, 4" OD duct Cabinet exhaust (optional): 150 SCFM at 1.5" H2O, 4" OD duct Facilities connections: back of system System transport and installation: Transport: 4 wheels Securing: screw type mounting feet with pads Dimensions (W x D x H): 108 x 40 x 48" Options available for an additional cost: (Qty 4) IntelliGen Mini Photoresist dispense systems: 2-Stage Steppor motor technology and diaphragm design Filter Mounting bracked Interface cables (Qty 2) IntelliGen HV Photoresist dispense systems: 2-Stage Steppor motor technology and diaphragm design Filter Mounting bracked Interface cables (Qty 4) 451-15-1-S IDS 1/4 x 1/4 units with suckback valves: Bushings and compression nuts for input and output connections (1) output 0 to 15 PSI pressure For resist (0-80cp), Barli, and ARC (0-80cp) Power supply Interface cables Software (Qty 2) CYBOR 7500 precision chemical dispense pumps: Mid-range viscosity: 300 cp to 3000 cp 3/8" Flare-type connections KALREX O-rings Variable rate dispense High-torque stepper motor control Dispense volume: maximum 16ml Programmable suckback Multiple recipe select On-board single-pump controls RS232, RS485, LON communications Power supply Interface cables Software Chill plate closed loop temperature control unit: Connection tubing Can be shared with more than one chill plate Developer temperature control unit: Closed loop recirculation heater / chiller Manifold and connection tubing to dispense arm Single temperature delivered to dispense arm Electro-polished 5-gallon SS solvent canisters, low-level sensing Dual chemistry developer dispense system.

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SVG 88-3 is a leading aqueous-developable photoresist equipment offering ultimate performance and resolution for the photolithography of state of the art semiconductor devices. This system consists of an innovative dual-layer resin-based film, containing an aqueous-developable negative-tone bottom layer, and an aqueous-developablebottom layer. The bottom layer is based on a highly modified polyvinylphenol-based polymer designed to offer excellent water solubility, good wet etch and dry etch resistance, excellent chemical resistance, and excellent optical and electron beam lithography resolution. The top layer is based on a high-density polyethylene blend that enables high contrast, clean resolution and rapid water-development. When used as a negative photoresist, 88-3 unit requires no pre-treatment and requires no post-baking step, enhancing process flexibility. The high-contrast light and electron beam lithography performance make it an attractive choice for circuit generation with an X-ray source. The excellent line-edge roughness of SVG 88-3 leads to very high image fidelity and minimized aerial image artifacts. The top layer is optimized for use with both 248-nm and 248/365-nm hybrid lithography. It exhibits improved line-width shift and contrast over conventional photoresists when used with 248/365-nm power. The bottom layer provides high-resolution capabilities and excellent water solubility, which is critical for use in modern semiconductor device lithography. The dual-layer combination improves contrast, provides excellent resistance to etching, is compatible with aqueous-developable photoresists, and offers low background. The aqueous-developable near-infrared imagery of 88-3 enables excellent contrast when compared to other leading photoresists. This capability makes it highly suited for sub-wavelength imaging, as well as imaging applications performed with several superimposed exposures. The negative tone of SVG 88-3 also offers high contrast when used with advanced illumination sources, making it ideal for use with high NA steppers and scan tools. When used as a positive photoresist, 88-3 machine exhibits excellent imaging properties and high resolution. The high-contrast resolution and excellent etch resistance enable the reliable fabrication of small-feature devices and avoid edge microscoping. Overall, SVG 88-3 provides superior resolution, etch resistance, optical resolution, and high-contrast imaging, while still offering significant process simplifications. Its unique two-layer combination makes it a particularly attractive choice for modern semiconductor device fabrication. This photoresist tool is the perfect choice for designers who want the maximum performance and resolution for their products.