Used SVG 88 Series #9033562 for sale
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ID: 9033562
Track system, 6"
Wafer: 6" glass
Wafer dual Track, 6"
Wafer flow: Left to Right
Transport wafer: ATS arm
Software have 99 process program capability with up to 9 event per program
Can "link" two or more programs together to create longer programs
Intergrades components exercise for system maintenance
Real time displaying motor speed
Capable to save or re-stored recipe and option data into CPU flash when CPU need repair
Auto calibration HPO wafer carrier motor
Full "2-way" diagnostics
Full range of programmable options
All modules grounded to Copper bar ground 1” X ¼” X 80”, “Copper bar ground” grounded to facility ground discharge static, clean signal
Coater Process: Moving/pivoting arm dispense with (3) dispense capability
Developer process: Moving dispense arm with 2 sprays, 2 stream nozzle, Air ring, top rinse and back side rinse
Track 1: Send-Vapor Prime-Chill-Coat-bake-Chill-Receive
Track 2: Send-Bake-Chill-Develop-Bake-Chill-Receive
Track 3: Send-Send - Coat-Bake - Receive-Receive
Track 4: Send-Send - Coat-Bake - Receive-Receive
Indexer Assembly:
Banner wafer sensor or Capacitive sensor
Grey Teflon coat platform
3/16" or 1/4" pitch (for 25 or 20 wafer cassettes)
Coater Assembly:
Moving/pivoting dispense assembly with 3 dispense capability
Peek material wafer chuck
Top EBR
Bottom EBR
Top, bottom EBR, catch cup rinse, tub fill (fill Pre-dispense cup by option select timing to prevent dispense nozzle dry off at home position, idle mode)
Upgraded Centering unit with dual cylinder shaft
Digital pressure (vacuum) switch
Sub-micron servo motor using brushless motor with Pacific Scientific controller max 6500 RPM +/-1 RPM no need calibration
Flat finder, wafer run smooth at high speed
Upgraded Stepper motor up/down 3 position Assy. for Spindle replace 3 position cylinder more stable, reliable
1 upgrade Cybor pump /each track
1 five gallon canister for EBR
1 five gallon canister for CCR
1 three gallon canister for Tub fill
CKD valve replacement for high cost, obsolete valve for Spindle valve assembly
Catch cup Assembly is easily removable, cleanable, also catch cup have the catch cup rinse assembly, clean itself by option select to set catch cup wash wafer count, catch cup wash time interval
Tub fill pre-dispense cup by option select fill solvent to the cup by timing prevent nozzle dry off when track at idle position, option select purge the dispense nozzle clean the tip itself before process, amount is equal amount to real process
High purity Teflon tubing for fluid line, dispense line
High level sensor for coater drain jar work with software
Low level sensor for Photo Resist bottle work with software
Low level sensor for EBR canister work with software
Developer Assembly:
Moving dispense arm Assembly with 2 spray, 2 stream nozzle
Peek material wafer chuck
Sub-micron servo motor using brushless motor with Pacific Scientific controller Max 6500RPM +/-1RPM no need calibration
Top rinse and backside rinse and air ring
Three way Teflon valve for DI water return for top rinse prevent particle build up
Digital vacuum switch
Upgraded Stepper motor up/down 3 position Assy. for Spindle replace 3 position cylinder
Flat finder, wafer run smooth at high speed
Cooling jacket for Developer fluid line,
CKD valve replacement for high cost, obsolete valve for Spindle valve assembly
Vapor Prime Assembly:
Stainless steel exhaust
Contact or proximity control bake with lid up
Vacuum or HMDS bake with lid down
All Teflon dispense lines
Pressure canister for HMDS
Hard clear anodized lid
Digital pressure (vacuum switch)
Cast-in heat element 450 W
Capable of operating at temperature ranging from 50 degree C to 400 degree C in dehydration bake cycle and to 200 degree C in vapor prime cycle
RTD temperature probe with 0.1 degree C increment readout
Remote digital temperature controller
Watlow EZ zone controller
Dual digital LED display
Auto tuning, +/-0.1% calibration accuracy
PID control-no drift or shifting
Temperature uniformity under +/- 2 degree C
Hot Plate Oven Assembly:
Stainless steel exhaust
Hard clear anodized HPO block
Three pin wafer lift assembly
HPO block with side-mounted vacuum port-guaranteed no leak
Contact or proximity control bake
Cast-in heater elements 450W
Watlow EZ zone Temperature controller
Dual digital LED display
Auto tuning, ±0.1% calibration accuracy
PID control – no drift or shifting
Temperature uniformity under ±2°C
RTD temperature probe with 0.1°C increment readout
HPO temperature range from 50°C to 400°C
Digital pressure (vacuum) switch
Remote digital temperature controller
Chill Plate Assembly:
Hard clear anodized chill plate
Three pin wafer lift assembly
Digital pressure (vacuum) switch
Power: 208VAC, 3 phase, 60Hz.
SVG 88 Series Photoresist is a specialized equipment created by SVG America for use in the printing industry. The system is designed to provide reliable, durable and accurate deposited coatings of photoresist materials onto substrates such as paper, cloth, film, foil, flexible substrates and more. 88 Series photoresist unit consists of a replaceable nozzle type applicator, a controller with a built-in pattern generation unit, and a platform capable of dispensing the precise amounts of photoresist required. The machine is capable of creating both single-layer and multi-layer coatings. The applicator uses static electricity to deposit the photoresist material and can be adjusted with precision to ensure an even layer is deposited on the substrate. SVG 88 Series photoresist tool is designed to be highly reliable and durable. The asset is certified for use in harsh environments and can be safely used in a variety of industrial sectors. The model is designed to provide accurate results every time and makes use of advanced software to help keep the substrate temperature consistent. The equipment is also capable of producing a wide range of patterns, allowing it to be used as a viable addition to a variety of printing applications. With the system, it is possible to replicate multiple copies of images or simply apply single layer or multi-layer coverage. The unit is also capable of achieving precise registration of patterns, meaning no overlap occurs when laying the resist. 88 Series photoresist machine is also designed with a user-friendly interface in mind. The tool is easily adjusted and controlled with no complex settings required. The asset is capable of creating a wide range of patterns, so users can easily adjust the settings to achieve optimum results. Additionally, the model is fully automated, allowing for efficient operation, and it is capable of self-calibrating for improved accuracy. In conclusion, SVG 88 Series photoresist equipment is a reliable, durable system designed for a variety of printing applications. The unit is designed to provide accurate and repeatable coatings and is fully automated for efficient operation. The machine is capable of creating a wide range of patterns and is also user-friendly with no complex settings required.
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